Recent advances in germanium emission
The optical properties of germanium can be tailored by combining strain engineering and n-
type doping. In this paper, we review the recent progress that has been reported in the study …
type doping. In this paper, we review the recent progress that has been reported in the study …
Band structure and optical gain of tensile-strained germanium based on a 30 band k⋅ p formalism
M El Kurdi, G Fishman, S Sauvage… - Journal of Applied …, 2010 - pubs.aip.org
We have investigated the band structure of tensile-strained germanium using a 30 band k⋅
p formalism. This multiband formalism allows to simultaneously describe the valence and …
p formalism. This multiband formalism allows to simultaneously describe the valence and …
Band engineering and growth of tensile strained Ge/(Si) GeSn heterostructures for tunnel field effect transistors
S Wirths, AT Tiedemann, Z Ikonic, P Harrison… - Applied physics …, 2013 - pubs.aip.org
In this letter, we propose a heterostructure design for tunnel field effect transistors with two
low direct bandgap group IV compounds, GeSn and highly tensely strained Ge in …
low direct bandgap group IV compounds, GeSn and highly tensely strained Ge in …
Toward a germanium laser for integrated silicon photonics
It has been demonstrated theoretically and experimentally that germanium, with proper
strain engineering and n-type doping, can be an efficient light emitter and a gain medium at …
strain engineering and n-type doping, can be an efficient light emitter and a gain medium at …
Strong enhancement of direct transition photoluminescence with highly tensile-strained Ge grown by molecular beam epitaxy
Highly tensile-strained layers of Ge were grown via molecular beam epitaxy using step-
graded In x Ga 1− x As buffer layers on (100) GaAs. These layers have biaxial tensile-strain …
graded In x Ga 1− x As buffer layers on (100) GaAs. These layers have biaxial tensile-strain …
Strained germanium thin film membrane on silicon substrate for optoelectronics
This work presents a novel method to introduce a sustainable biaxial tensile strain larger
than 1% in a thin Ge membrane using a stressor layer integrated on a Si substrate. Raman …
than 1% in a thin Ge membrane using a stressor layer integrated on a Si substrate. Raman …
Control of direct band gap emission of bulk germanium by mechanical tensile strain
M El Kurdi, H Bertin, E Martincic… - Applied Physics …, 2010 - pubs.aip.org
We show that the recombination energy of the direct band gap photoluminescence (PL) of
germanium can be controlled by an external mechanical stress. The stress is provided by an …
germanium can be controlled by an external mechanical stress. The stress is provided by an …
Lasing in Group-IV materials
Silicon photonics in the near-IR, up to 1.6 µm, is already one of key technologies in optical
data communications, particularly short range. It also is being prospected for applications in …
data communications, particularly short range. It also is being prospected for applications in …
Germanium based photonic components toward a full silicon/germanium photonic platform
V Reboud, A Gassenq, JM Hartmann, J Widiez… - Progress in Crystal …, 2017 - Elsevier
Lately, germanium based materials attract a lot of interest as they can overcome some limits
inherent to standard Silicon Photonics devices and can be used notably in Mid-Infra-Red …
inherent to standard Silicon Photonics devices and can be used notably in Mid-Infra-Red …
Tensile-strained germanium microdisks
We show that a strong tensile strain can be applied to germanium microdisks using silicon
nitride stressors. The transferred strain allows one to control the direct band gap emission …
nitride stressors. The transferred strain allows one to control the direct band gap emission …