Computer simulation of obtaining thin films of silicon carbide
AY Galashev, KA Abramova - Physical Chemistry Chemical Physics, 2023 - pubs.rsc.org
Silicon carbide films are potential candidates for the development of microsystems with
harsh environmental conditions. In this work, the production of high-purity silicon carbide …
harsh environmental conditions. In this work, the production of high-purity silicon carbide …
Recent developments on silicon carbide thin films for piezoresistive sensors applications
The increasing demand for microelectromechanical systems (MEMS) as, for example,
piezoresistive sensors with capabilities of operating at high temperatures, mainly for …
piezoresistive sensors with capabilities of operating at high temperatures, mainly for …
Optical Properties of Amorphous Silicon–Carbon Alloys (a-Si x C1-x ) Deposited by RF Co-Sputtering
A El Khalfi, E Ech-chamikh, Y Ijdiyaou, M Azizan… - Arabian Journal for …, 2014 - Springer
Amorphous silicon–carbon alloy (a-Si x C 1-x) thin films have been deposited by radio
frequency (RF) sputter deposition. These films were obtained, from a composite target …
frequency (RF) sputter deposition. These films were obtained, from a composite target …
[PDF][PDF] 水解反应法合成核壳结构聚丁二烯/二氧化硅杂化材料
宋晓菊, 鲁建民, 张恩浩, 韩丙勇 - 北京化工大学学报(自然科学版 …, 2012 - journal.buct.edu.cn
利用先末端氯硅烷化线形活性阴离子聚丁二烯, 然后水解的方法合成了聚丁二烯/二氧化硅(PB/
SiO 2) 杂化材料, 采用红外光谱, GPC 和TG 分析了PB/SiO 2 杂化材料的结构及性能 …
SiO 2) 杂化材料, 采用红外光谱, GPC 和TG 分析了PB/SiO 2 杂化材料的结构及性能 …
Low-pressure deposition techniques of silicon carbide thin films: An overview
Silicon carbide (SiC) has numerous outstanding properties that make it an interesting
material for high-temperature/high-voltage semiconductor electronics applications. In recent …
material for high-temperature/high-voltage semiconductor electronics applications. In recent …
[图书][B] Applications of atmospheric plasmas
CJ Oldham - 2009 - search.proquest.com
Surface modification techniques using plasmas have historically been completed in a low
pressure environment due to Pd (pressure x gap distance) considerations influencing the …
pressure environment due to Pd (pressure x gap distance) considerations influencing the …
[PDF][PDF] A. El Khalfi, E. Ech-chamikh, Y. Ijdiyaou, M. Azizan & A. Essafti
RF Co-Sputtering - researchgate.net
Amorphous silicon–carbon alloy (a-SixC1− x) thin films have been deposited by radio
frequency (RF) sputter deposition. These films were obtained, from a composite target …
frequency (RF) sputter deposition. These films were obtained, from a composite target …
[PDF][PDF] Structural and optical properties of RF sputtered SixC1-x thin films
M Azizan, A Essafti - Global Journal of Physical Chemistry …, 2011 - researchgate.net
Abstract Silicon carbide (SixC1-x) thin films with various Si/C ratio values have been
deposited by radio frequency (RF) co-sputtering. These films were deposited, at different RF …
deposited by radio frequency (RF) co-sputtering. These films were deposited, at different RF …