Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)

A Anders - Journal of Applied Physics, 2017 - pubs.aip.org
High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

High power pulsed magnetron sputtering: A review on scientific and engineering state of the art

K Sarakinos, J Alami, S Konstantinidis - Surface and coatings technology, 2010 - Elsevier
High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

Physics and technology of magnetron sputtering discharges

JT Gudmundsson - Plasma Sources Science and Technology, 2020 - iopscience.iop.org
Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017

JE Greene - Journal of Vacuum Science & Technology A, 2017 - pubs.aip.org
The use of thin films to enhance the physical and chemical properties of materials is
ubiquitous in today's world. Examples are shown in Fig. 1: copper metallization layers for …

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

A Anders - Surface and Coatings Technology, 2014 - Elsevier
High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

An introduction to thin film processing using high-power impulse magnetron sputtering

D Lundin, K Sarakinos - Journal of Materials Research, 2012 - cambridge.org
High-power impulse magnetron sputtering (HiPIMS) is a promising sputtering-based ionized
physical vapor deposition technique and is already making its way to industrial applications …

Tutorial: Hysteresis during the reactive magnetron sputtering process

K Strijckmans, R Schelfhout, D Depla - Journal of Applied Physics, 2018 - pubs.aip.org
Reactive magnetron sputtering is a well-established physical vapor technique to deposit thin
compound films on different substrates, ranging from insulating glass windows over wear …

Deposition rates of high power impulse magnetron sputtering: Physics and economics

A Anders - Journal of Vacuum Science & Technology A, 2010 - pubs.aip.org
Deposition by high power impulse magnetron sputtering (HIPIMS) is considered by some as
the new paradigm of advanced sputtering technology, yet this is met with skepticism by …

Magnetron sputtered titanium carbide-based coatings: A review of science and technology

H Larhlimi, A Ghailane, M Makha, J Alami - Vacuum, 2022 - Elsevier
Titanium carbide (TiC) coatings are widely used in several industrial applications, including
tooling and tribological applications. These materials are used due to their mechanical …

Plasma diagnostics for understanding the plasma–surface interaction in HiPIMS discharges: a review

N Britun, T Minea, S Konstantinidis… - Journal of Physics D …, 2014 - iopscience.iop.org
The physical and chemical aspects of plasma–surface interaction in high-power impulse
magnetron sputtering (HiPIMS) discharges are overviewed. The data obtained by various …