Due to the unique set of properties possessed by ZnO, thin films of ZnO have received more
and more interest in the last 20 years as a potential material for applications such as thin-film …

Nanosized ZnO-based materials for catalytic and sensing applications are highly proficient
over bulk catalytic analogous due to higher surface and tunable physicochemical properties …

In the past decade, atomic layer deposition (ALD) has become an important thin film
deposition technique for applications in nanoelectronics, catalysis, and other areas due to its …

This article reviews the process-structure-property relationship in doped ZnO thin films via
atomic layer deposition (ALD). ALD is an important manufacturing-scalable, layer-by-layer …

ZnO/Al 2 O 3 multilayers were prepared by alternating atomic layer deposition (ALD) at 150°
C using diethylzinc, trimethylaluminum, and water. The growth process, crystallinity, and …

The initial phases of the ALD growth of ZnO have been examined. It is shown that ZnO
exhibits an island-like growth on Si, layer-by-layer on GaN, whereas on sapphire, the growth …

Current research has concentrated on the development of ZnAl 2 O 4 (gahnite) spinel
nanostructure through anti-reflection coating (ARC) material for improved power conversion …

In this work, the structural, electrical, and optical properties as well as chemical bonding
state of Al-doped ZnO films deposited by atomic layer deposition have been investigated to …

The rapid development of wearable and disposable electronic devices and the rising
awareness of environmental sustainability impose growing new demands on the nature …

Doped ZnO films are an important class of transparent conductive oxides, with many
applications demanding increased growth control and low deposition temperatures …