Reliability of HfO2-Based Ferroelectric FETs: A Critical Review of Current and Future Challenges
Ferroelectric transistors (FeFETs) based on doped hafnium oxide (HfO2) have received
much attention due to their technological potential in terms of scalability, high-speed, and …
much attention due to their technological potential in terms of scalability, high-speed, and …
Disturb-free operations of multilevel cell ferroelectric FETs for NAND applications
C Jin, J Xu, J Gu, J Zhao, X Jia, J Chen… - … on Electron Devices, 2023 - ieeexplore.ieee.org
We have experimentally investigated disturb-free operations of multilevel cell (MLC)
ferroelectric field-effect transistors (FeFETs) in a NAND array. The fabricated FeFET cells are …
ferroelectric field-effect transistors (FeFETs) in a NAND array. The fabricated FeFET cells are …
Impact of domain wall motion on the memory window in a multidomain ferroelectric FET
N Pandey, YS Chauhan - IEEE Electron Device Letters, 2022 - ieeexplore.ieee.org
This letter studies the impact of multi-domain dynamics on the memory window (MW) of a
Ferroelectric FET (FeFET). The memory window primarily depends on the density of …
Ferroelectric FET (FeFET). The memory window primarily depends on the density of …
A compact model of ferroelectric field-effect transistor
In this letter, we present a compact model of ferroelectric field-effect-transistor (FEFET). The
model consists of a ferroelectric (FE) capacitor model and a Berkeley Short-channel IGFET …
model consists of a ferroelectric (FE) capacitor model and a Berkeley Short-channel IGFET …
An analytical interpretation of the memory window in ferroelectric field-effect transistors
In this study, we present an analytical equation for describing the memory window of
ferroelectric field-effect transistors (FeFETs). The analytical equation is derived based on the …
ferroelectric field-effect transistors (FeFETs). The analytical equation is derived based on the …
Nucleation-limited switching dynamics model for efficient ferroelectrics circuit simulation
D Antoniadis, T Kim… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
The nucleation-limited switching (NLS) model has been shown in the literature to explain
successfully the dynamics of polarization switching of polycrystalline ferroelectric films (FE) …
successfully the dynamics of polarization switching of polycrystalline ferroelectric films (FE) …
A compact model of metal–ferroelectric-insulator–semiconductor tunnel junction
In this article, we present a compact model of metal–ferroelectric (FE)–insulator–
semiconductor (MFIS) tunnel junction. Unlike the metal–FE–metal (MFM) structure with only …
semiconductor (MFIS) tunnel junction. Unlike the metal–FE–metal (MFM) structure with only …
On the modeling of polycrystalline ferroelectric thin films: Landau-based models versus Monte Carlo-based models versus experiment
Due to the potential for technological application, there has been an explosion of interest in
heavily polycrystalline ferroelectric nanofilms, such as those of doped hafnium oxide …
heavily polycrystalline ferroelectric nanofilms, such as those of doped hafnium oxide …
A compact model of antiferroelectric capacitor
In this paper, we develop a compact model of antiferroelectric (AFE) capacitors. AFE
material, similar to the ferroelectric (FE) material, is a good candidate for non-volatile …
material, similar to the ferroelectric (FE) material, is a good candidate for non-volatile …
A compact model for ferroelectric capacitors based on multidomain phase-field framework
A generalized and fast multidomain phase-field-based compact model for the metal-
ferroelectric-metal (MFM) capacitor is presented. Time-dependent Landau–Ginzburg (TDGL) …
ferroelectric-metal (MFM) capacitor is presented. Time-dependent Landau–Ginzburg (TDGL) …