A review of interconnect materials used in emerging memory device packaging: First-and second-level interconnect materials

YS Zou, CL Gan, MH Chung, H Takiar - Journal of Materials Science …, 2021 - Springer
The main motivation of this review is to study the evolution of first and second level of
interconnect materials used in memory device semiconductor packaging. Evolutions of …

Interfacial characterization of SLM parts in multi-material processing: Intermetallic phase formation between AlSi10Mg and C18400 copper alloy

SL Sing, LP Lam, DQ Zhang, ZH Liu, CK Chua - Materials Characterization, 2015 - Elsevier
Multi-material processing in selective laser melting (SLM) using AlSi10Mg and UNS C18400
copper alloy was carried out. The interfacial characteristics were analyzed with FIB, SEM …

Copper wire bonding concerns and best practices

P Chauhan, ZW Zhong, M Pecht - Journal of Electronic Materials, 2013 - Springer
Copper wire bonding of microelectronic parts has developed as a means to cut the costs of
using the more mature technology of gold wire bonding. However, with this new technology …

[图书][B] Copper wire bonding

PS Chauhan, A Choubey, ZW Zhong, MG Pecht… - 2014 - Springer
Chapter 1 gives an introduction to Cu wire bonding technology. The advantages of Cu over
Au, such as lower cost, higher mechanical strength, and higher electrical and thermal …

Interfacial microstructures and thermodynamics of thermosonic Cu-wire bonding

J Li, L Liu, L Deng, B Ma, F Wang… - IEEE Electron Device …, 2011 - ieeexplore.ieee.org
The interfacial microstructures of the Cu-wire bonding to an Al pad are investigated first by
using an X-ray microdiffractometer and high-resolution transmission electron microscopy. It …

Evolutions of bonding wires used in semiconductor electronics: perspective over 25 years

CL Gan, U Hashim - Journal of Materials Science: Materials in Electronics, 2015 - Springer
The objective of this review is to study the evolution and key findings and critical technical
challenges, solutions and future trend of bonding wires used in semiconductor electronics …

[HTML][HTML] Microstructure variation in the ultrasonic bonding process between Al sheets observed by in-situ transmission electron microscopy

C Iwamoto, Y Ohtani, K Hamada - Scripta Materialia, 2023 - Elsevier
In-situ transmission electron microscopy (TEM) is developed to observe the microstructure
evolution during ultrasonic bonding. It was found that many nanoparticles were generated …

Cu-Al interfacial formation and kinetic growth behavior during HTS reliability test

CP Liu, SJ Chang, YF Liu, WS Chen - Journal of Materials Processing …, 2019 - Elsevier
Reverse engineering techniques of Cu wire bonding process used in manufacturing
microelectronic packing components are proposed for evaluating Cu-Al intermetallic …

[HTML][HTML] Influence of Pd-Layer Thickness on Bonding Reliability of Pd-Coated Cu Wire

J Fan, D Yuan, J Du, T Hou, F Wang, J Cao, X Yang… - Micromachines, 2024 - mdpi.com
In this paper, three Pd-coated Cu (PCC) wires with different Pd-layer thicknesses were used
to make bonding samples, and the influence of Pd-layer thickness on the reliability of …

Dynamics features of Cu-wire bonding during overhang bonding process

L Junhui, L Linggang, M Bangke… - IEEE Electron Device …, 2011 - ieeexplore.ieee.org
Cu-wire overhang bonding process is investigated first by a high-speed camera system. It
was found that the greater impact, rebound, and deflection of overhang die during the Cu …