GaN FinFETs and trigate devices for power and RF applications: Review and perspective

Y Zhang, A Zubair, Z Liu, M Xiao… - Semiconductor …, 2021 - iopscience.iop.org
Gallium nitride (GaN) is becoming a mainstream semiconductor for power and radio-
frequency (RF) applications. While commercial GaN devices are increasingly being adopted …

Selective area regrowth and doping for vertical gallium nitride power devices: Materials challenges and recent progress

H Fu, K Fu, C Yang, H Liu, KA Hatch, P Peri… - Materials Today, 2021 - Elsevier
This paper reviews materials challenges and recent progress for selective area regrowth
and doping for vertical gallium nitride (GaN) power devices. The purpose is to realize …

1.2-kV vertical GaN fin-JFETs: High-temperature characteristics and avalanche capability

J Liu, M Xiao, R Zhang, S Pidaparthi… - … on Electron Devices, 2021 - ieeexplore.ieee.org
This work describes the high-temperature performance and avalanche capability of normally-
off 1.2-K V-CLASS vertical gallium nitride (GaN) fin-channel junction field-effect transistors …

Vertical GaN power devices: Device principles and fabrication technologies—Part II

H Fu, K Fu, S Chowdhury, T Palacios… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
Vertical gallium nitride (GaN) power devices are enabling next-generation power electronic
devices and systems with higher energy efficiency, higher power density, faster switching …

Unveiling the influence of selective-area-regrowth interfaces on local electronic properties of GaN pn junctions for efficient power devices

AS Chang, B Li, S Wang, S Frisone, RS Goldman… - Nano Energy, 2022 - Elsevier
We report correlated nanoscale mapping of the structure, composition, and properties of
regrown GaN pn junctions to identify how etching and non-planar regrowth processes limit …

Investigation of vertical GaN-on-GaN p–n diode with regrown p-GaN for operation in Venus and other extreme environments

S Luo, K Fu, Q Xie, M Yuan, G Gao, H Guo… - Applied Physics …, 2023 - pubs.aip.org
This Letter reports the performance of vertical GaN-on-GaN p–n diodes with etch-then-
regrown p-GaN after exposure to a simulated Venus environment (460 C,∼ 94 bar …

Selective area doping of GaN toward high-power applications

RA Ferreyra, B Li, S Wang, J Han - Journal of Physics D: Applied …, 2023 - iopscience.iop.org
Selective area doping in GaN, especially p-type, is a critical and inevitable building block for
the realization of advanced device structures for high-power applications, including, but not …

Analysis of vertical GaN JBS and pn diodes by Mg ion implantation and ultrahigh-pressure annealing

SR Stein, D Khachariya, W Mecouch… - … on Electron Devices, 2023 - ieeexplore.ieee.org
We report on vertical GaN junction barrier Schottky (JBS) diodes formed by Mg ion
implantation and ultrahigh-pressure annealing (UHPA). The static ON-state characteristics of …

Study of AlGaN/GaN vertical superjunction HEMT for improvement of breakdown voltage and specific on-resistance

M Zhang, Z Guo, Y Huang, Y Li, J Ma, X Xia… - IEEE …, 2021 - ieeexplore.ieee.org
A GaN-based vertical superjunction high electron mobility transistor (SJ HEMT) with a
composite structure (CS-SJ HEMT) is proposed and analyzed by Silvaco TCAD to improve …

Facet control and material redistribution in GaN growth on three-dimensional structures

I Manglano Clavero, C Margenfeld… - Crystal Growth & …, 2022 - ACS Publications
In this work, the influence of temperature and ammonia partial pressure on the GaN shell
morphology grown on GaN microfin cores is investigated. We demonstrate that GaN …