Lithium metal batteries (LMBs) are one of the most promising energy storage technologies
that would overcome the limitations of current Li‐ion batteries, based on their low density …

In plasma-based deposition processing, the importance of low-energy ion bombardment
during thin film growth can hardly be exaggerated. Ion bombardment is an important …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to
plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

Plasma-induced defects are often recognized in state-of-the-art semiconductors, high-
efficiency solar cells and high-sensitivity image sensors. These defects are in the form of a …

Modern condensed-matter physics is increasingly concerned with the design, synthesis,
analysis, and exploitation of chemically complex materials and structures. Complex metal …

The fourth revised edition of this chapter focuses on current applications of sputter
processing to the semiconductor industry. The physical fundamentals behind sputtering, or …

Physical Vapor Deposition (PVD) is a widely utilized process in various industrial
applications, serving as a protective and hard coating. However, its presence in fields like …

There has been a recent surge in interest toward thin film-based solar cells, specifically new
absorber materials composed by Earth-abundant and non-toxic elements. Among these …