Abstract Ultrafast UV photodetectors (UV PDs) are crucial components in modern
optoelectronics because conventional detectors have reached a bottleneck with low …

Atomic layer etching (ALE) is a technique for removing thin layers of material using
sequential reaction steps that are self-limiting. ALE has been studied in the laboratory for …

Abstract Journal of Physics D: Applied Physics published the first Plasma Roadmap in 2012
consisting of the individual perspectives of 16 leading experts in the various sub-fields of low …

The spread of bacteria through contaminated surfaces is a major issue in healthcare, food
industry, and other economic sectors. The widespread use of antibiotics is not a sustainable …

The ability to achieve near-atomic precision in etching different materials when transferring
lithographically defined templates is a requirement of increasing importance for nanoscale …

Because of the unique properties of plasma technology, its use in gas conversion
applications is gaining significant interest around the globe. Plasma-based CO2 and CH4 …

Many different gas discharges and plasmas exhibit bistable states under a given set of
conditions, and the history-dependent hysteresis that is manifested by intensive quantities of …

Low temperature plasma (LTP)-based synthesis of advanced materials has played a
transformational role in multiple industries, including the semiconductor industry, liquid …

The use of plasmas as a reactive mixture of ions, electrons and neutrals is at the core of
numerous technologies in industry, enabling applications in microelectronics, automotives …

Etching technology–one of the representative modern semiconductor device makers–serves
as a broad descriptor for the process of removing material from the surfaces of various …