Growth and applications of group III-nitrides
O Ambacher - Journal of physics D: Applied physics, 1998 - iopscience.iop.org
Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the
different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures …
different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures …
Optoelectronic device physics and technology of nitride semiconductors from the UV to the terahertz
TD Moustakas, R Paiella - Reports on Progress in Physics, 2017 - iopscience.iop.org
This paper reviews the device physics and technology of optoelectronic devices based on
semiconductors of the GaN family, operating in the spectral regions from deep UV to …
semiconductors of the GaN family, operating in the spectral regions from deep UV to …
X-ray diffraction of III-nitrides
MA Moram, ME Vickers - Reports on progress in physics, 2009 - iopscience.iop.org
The III-nitrides include the semiconductors AlN, GaN and InN, which have band gaps
spanning the entire UV and visible ranges. Thin films of III-nitrides are used to make UV …
spanning the entire UV and visible ranges. Thin films of III-nitrides are used to make UV …
Elastic constants of gallium nitride
A Polian, M Grimsditch, I Grzegory - Journal of Applied Physics, 1996 - pubs.aip.org
The elastic constants of GaN have been determined using Brillouin scattering; in GPa they
are: C11 390, C33 398, C44 105, C66 123, C12 145, and C13 106. Our values differ …
are: C11 390, C33 398, C44 105, C66 123, C12 145, and C13 106. Our values differ …
[HTML][HTML] Size dictated thermal conductivity of GaN
TE Beechem, AE McDonald, EJ Fuller… - Journal of Applied …, 2016 - pubs.aip.org
The thermal conductivity of n-and p-type doped gallium nitride (GaN) epilayers having
thicknesses of 3–4 μm was investigated using time domain thermoreflectance. Despite …
thicknesses of 3–4 μm was investigated using time domain thermoreflectance. Despite …
Temperature dependence of the thermal expansion of GaN
C Roder, S Einfeldt, S Figge, D Hommel - Physical Review B—Condensed …, 2005 - APS
The thermal expansion of hexagonal GaN bulk crystals was studied in an extended
temperature range from 12 to 1025 K. The lattice parameters a and c were measured by …
temperature range from 12 to 1025 K. The lattice parameters a and c were measured by …
[图书][B] related Semiconductors
Controlled introduction of impurities forms the basis of much of semiconductor technology;
indeed p-type (acceptor-doped) and n-type (donor-doped) layers and the junctions between …
indeed p-type (acceptor-doped) and n-type (donor-doped) layers and the junctions between …
Rietveld-refinement study of aluminium and gallium nitrides
W Paszkowicz, S Podsiadło, R Minikayev - Journal of alloys and …, 2004 - Elsevier
Powder diffraction data for fine AlN and GaN powders were collected at a Bragg–Brentano
diffractometer equipped with a Johansson monochromator and a semiconductor strip …
diffractometer equipped with a Johansson monochromator and a semiconductor strip …
Dependence of the fundamental band gap of on alloy composition and pressure
W Shan, JW Ager III, KM Yu, W Walukiewicz… - Journal of Applied …, 1999 - pubs.aip.org
Optical absorption studies were performed to investigate the dependence of the
fundamental band gap of Al x Ga 1− x N epitaxial films on Al content and applied hydrostatic …
fundamental band gap of Al x Ga 1− x N epitaxial films on Al content and applied hydrostatic …
[HTML][HTML] Thermal atomic layer etching of crystalline GaN using sequential exposures of XeF2 and BCl3
Gallium nitride (GaN) is a wide-bandgap semiconductor that is useful for optoelectronics and
high speed and high power electronics. Fabrication of GaN devices requires etching for …
high speed and high power electronics. Fabrication of GaN devices requires etching for …