GaN-on-Si power technology: Devices and applications

KJ Chen, O Häberlen, A Lidow… - … on Electron Devices, 2017 - ieeexplore.ieee.org
In this paper, we present a comprehensive review and discussion of the state-of-the-art
device technology and application development of GaN-on-Si power electronics. Several …

Recent advances in GaN‐based power HEMT devices

J He, WC Cheng, Q Wang, K Cheng… - Advanced electronic …, 2021 - Wiley Online Library
The ever‐increasing power density and operation frequency in electrical power conversion
systems require the development of power devices that can outperform conventional Si …

Reliability, applications and challenges of GaN HEMT technology for modern power devices: A review

N Islam, MFP Mohamed, MFAJ Khan, S Falina… - Crystals, 2022 - mdpi.com
A new generation of high-efficiency power devices is being developed using wide bandgap
(WBG) semiconductors, like GaN and SiC, which are emerging as attractive alternatives to …

Well‐defined nanostructures for electrochemical energy conversion and storage

R Xu, L Du, D Adekoya, G Zhang… - Advanced Energy …, 2021 - Wiley Online Library
Electrochemical energy conversion and storage play crucial roles in meeting the increasing
demand for renewable, portable, and affordable power supplies for society. The rapid …

Forward bias gate breakdown mechanism in enhancement-mode p-GaN gate AlGaN/GaN high-electron mobility transistors

TL Wu, D Marcon, S You, N Posthuma… - IEEE Electron device …, 2015 - ieeexplore.ieee.org
In this letter, we studied the forward bias gate breakdown mechanism on enhancement-
mode p-GaN gate AlGaN/GaN high-electron mobility transistors. To the best of our …

Integration of LPCVD-SiNx gate dielectric with recessed-gate E-mode GaN MIS-FETs: Toward high performance, high stability and long TDDB lifetime

M Hua, Z Zhang, J Wei, J Lei, G Tang… - 2016 IEEE …, 2016 - ieeexplore.ieee.org
By employing an interface protection technique to overcome the degradation of etched GaN
surface in high-temperature process, highly reliable LPCVD-SiN x gate dielectric was …

Studies on High-Voltage GaN-on-Si MIS-HEMTs Using LPCVD Si3N4 as Gate Dielectric and Passivation Layer

Z Zhang, G Yu, X Zhang, X Deng, S Li… - … on Electron Devices, 2016 - ieeexplore.ieee.org
This paper investigates the performance of AlGaN/gallium nitride (GaN) MIS high electron
mobility transistors (MIS-HEMTs). The gate dielectric layer and the surface passivation layer …

Recent developments and prospects of fully recessed MIS gate structures for GaN on Si power transistors

P Fernandes Paes Pinto Rocha, L Vauche… - Energies, 2023 - mdpi.com
For high electron mobility transistors (HEMTs) power transistors based on AlGaN/GaN
heterojunction, p-GaN gate has been the gate topology commonly used to deplete the two …

Normally OFF GaN-on-Si MIS-HEMTs Fabricated With LPCVD-SiNx Passivation and High-Temperature Gate Recess

Y Shi, S Huang, Q Bao, X Wang, K Wei… - … on Electron Devices, 2016 - ieeexplore.ieee.org
Low-current-collapse normally OFF GaN-on-Si MIS high-electron-mobility transistors (MIS-
HEMTs) are fabricated with low-pressure chemical-vapor-deposited SiN x (LPCVD-SiN x) …

Performance and VTH Stability in E-Mode GaN Fully Recessed MIS-FETs and Partially Recessed MIS-HEMTs With LPCVD-SiNx/PECVD-SiNx Gate Dielectric …

J He, M Hua, Z Zhang, KJ Chen - IEEE Transactions on Electron …, 2018 - ieeexplore.ieee.org
In this paper, we carried out a systematic comparison between the enhancement-mode GaN-
based fully recessed metal-insulator-semiconductor field-effect transistors (MIS-FETs) and …