Defect engineering in SiC technology for high-voltage power devices

T Kimoto, H Watanabe - Applied Physics Express, 2020 - iopscience.iop.org
Major features of silicon carbide (SiC) power devices include high blocking voltage, low on-
state loss, and fast switching, compared with those of the Si counterparts. Through recent …

Emerging SiC applications beyond power electronic devices

F La Via, D Alquier, F Giannazzo, T Kimoto, P Neudeck… - Micromachines, 2023 - mdpi.com
In recent years, several new applications of SiC (both 4H and 3C polytypes) have been
proposed in different papers. In this review, several of these emerging applications have …

High-voltage SiC power devices for improved energy efficiency

T Kimoto - Proceedings of the Japan Academy, Series B, 2022 - jstage.jst.go.jp
Silicon carbide (SiC) power devices significantly outperform the well-established silicon (Si)
devices in terms of high breakdown voltage, low power loss, and fast switching. This review …

SiC complementary junction field-effect transistor logic gate operation at 623 K

M Kaneko, M Nakajima, Q Jin… - IEEE Electron Device …, 2022 - ieeexplore.ieee.org
Here, we show that silicon carbide (SiC) complementary logic gates composed of p-and n-
channel junction field-effect transistors (JFETs) fabricated by ion implantation operate at 623 …

A novel optimum variation lateral doping SiC lateral double-diffused metal oxide semiconductor with improved performance

M Kong, Y Duan, J Gao, R Yan… - Semiconductor …, 2022 - iopscience.iop.org
In thsi paper a novel optimum variation lateral doping 4H-SiC lateral double-diffused metal
oxide semiconductor (LDMOS) field-effect transistor with improved performance is proposed …

Experimental determination of impact ionization coefficients along< 1120> in 4H-SiC

D Stefanakis, X Chi, T Maeda… - IEEE Transactions on …, 2020 - ieeexplore.ieee.org
The impact ionization coefficients along the (112̅0) direction in 4H-SiC were extracted by
analyzing photocurrent of mesa epitaxial pn diodes with punchthrough (PT) structures …

Tunneling current in 4H-SiC pn junction diodes

M Kaneko, X Chi, T Kimoto - IEEE Transactions on Electron …, 2020 - ieeexplore.ieee.org
Heavily doped 4H-silicon carbide (SiC) epitaxial pn junction diodes are fabricated, and their
tunneling current under reverse-biased condition is investigated. Soft increase of the …

Physical properties of sulfur double donors in 4H-SiC introduced by ion implantation

T Matsuoka, M Kaneko, T Kimoto - Japanese Journal of Applied …, 2023 - iopscience.iop.org
The activation ratio and the ionization energy (ΔE) of sulfur (S) atoms implanted in n-type 4H-
SiC were investigated. It was revealed that implanted sulfur atoms show almost no diffusion …

CJM: a compact model for double-gate junction FETs

N Makris, M Bucher, F Jazaeri… - IEEE Journal of the …, 2019 - ieeexplore.ieee.org
The double-gate (DG) junction field-effect transistor (JFET) is a classical electron device,
with a simple structure that presents many advantages in terms of device fabrication but also …

Carrier trapping effects on forward characteristics of SiC pin diodes fabricated on high-purity semi-insulating substrates

K Takahashi, H Tanaka, M Kaneko… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Carrier trapping effects of high-concentration deep levels in high-purity semi-insulating
(HPSI) silicon carbide (SiC) substrates on device characteristics were investigated. Vertical …