Sensitive photoresists for rapid multiphoton 3D laser micro‐and nanoprinting

P Kiefer, V Hahn, M Nardi, L Yang… - Advanced Optical …, 2020 - Wiley Online Library
Driven by recent advances in rapid multiphoton single‐focus 3D laser nanoprinting,
multifocus variants thereof, and projection‐based multiphoton 3D laser nanoprinting, the …

Lens-based fluorescence nanoscopy

C Eggeling, KI Willig, SJ Sahl, SW Hell - Quarterly reviews of …, 2015 - cambridge.org
The majority of studies of the living cell rely on capturing images using fluorescence
microscopy. Unfortunately, for centuries, diffraction of light was limiting the spatial resolution …

120 nm resolution and 55 nm structure size in STED-lithography

R Wollhofen, J Katzmann, C Hrelescu, J Jacak… - Optics express, 2013 - opg.optica.org
Two–photon direct laser writing (DLW) lithography is limited in the achievable structure size
as well as in structure resolution. Adding stimulated emission depletion (STED) to DLW …

Single-color peripheral photoinhibition lithography of nanophotonic structures

M He, Z Zhang, C Cao, Y Qiu, X Shen, G Zhou, Z Cai… - PhotoniX, 2022 - Springer
Advances in direct laser writing to attain super-resolution are required to improve fabrication
performance and develop potential applications for nanophotonics. In this study, a novel …

Ultrafast laser applications in manufacturing processes: A state-of-the-art review

S Lei, X Zhao, X Yu, A Hu… - Journal of …, 2020 - asmedigitalcollection.asme.org
With the invention of chirped pulse amplification for lasers in the mid-1980s, high power
ultrafast lasers entered into the world as a disruptive tool, with potential impact on a broad …

Polymerization kinetics in three-dimensional direct laser writing.

JB Mueller, J Fischer, F Mayer, M Kadic… - … (Deerfield Beach, Fla.), 2014 - europepmc.org
By in-situ measuring the scattered light during microstructure formation, the polymerization
kinetics of three-dimensional direct laser writing are investigated in detail. Oxygen …

3D sub‐diffraction printing by multicolor photoinhibition lithography: from optics to chemistry

M He, Z Zhang, C Cao, G Zhou… - Laser & Photonics …, 2022 - Wiley Online Library
Photoinhibition lithography (PIL) is a nanoscale fabrication technique that uses multicolor
visible light to enable the printing of arbitrary 3D structures beyond the diffraction limit …

Light and matter co-confined multi-photon lithography

L Guan, C Cao, X Liu, Q Liu, Y Qiu, X Wang… - nature …, 2024 - nature.com
Mask-free multi-photon lithography enables the fabrication of arbitrary nanostructures low
cost and more accessible than conventional lithography. A major challenge for multi-photon …

[HTML][HTML] 双光束超分辨激光直写纳米加工技术

曹耀宇, 谢飞, 张鹏达, 李向平 - 光电工程, 2017 - cn.oejournal.org
随着纳米技术的不断发展, 各行业领域对纳米尺寸结构的加工需求与日剧增,
激光直写加工技术作为一项重要的三维微纳结构加工手段, 在多个现代科学技术领域得到了广泛 …

Sub-Abbe resolution: from STED microscopy to STED lithography

TA Klar, R Wollhofen, J Jacak - Physica Scripta, 2014 - iopscience.iop.org
We review the emergence of three-dimensional sub-Abbe optical nanoscopy, which in its
original version deployed stimulated-emission-induced depletion (STED) of the excited state …