Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …

Atomic layer deposition (ALD) is a method of choice for the growth of highly conformal thin
films with accurately controlled thickness on planar and nanostructured surfaces. These …

High carrier recombination loss at the contact regions has become the dominant factor
limiting the power conversion efficiency (PCE) of crystalline silicon (c‐Si) solar cells. Dopant …

Potassium ion hybrid capacitors (KICs) have drawn tremendous attention for large-scale
energy storage applications because of their high energy and power densities and the …

Perovskite solar cells (PSCs) have attracted tremendous interest due to their outstanding
intrinsic photovoltaic properties, such as absorption coefficients, exciton binding energies …

Herein, we report a facile approach for the synthesis of TiO2 nanoparticles tethered on 2D
mixed valent vanadium oxide (VO x/TiO2) nanoflakelets using a thermal decomposition …

Atomic layer deposition (ALD) is not just a thin film deposition technology limited to the
semiconductor IC industries to grow high-k gate dielectric or a Cu diffusion barrier layer. In …

We report a feasible and high-throughput method for high-quality W-doped VO2
nanostructured epitaxial films on r-sapphire substrate fabrication. Single-phase, smooth …

Vanadium dioxide (VO 2) is a representative metal–insulator-transition (MIT) material that
undergoes a reversible phase transition at 68° C, which is close to room temperature. This …

V 2 O 5 is one of the best material for many applications. Progress is currently made to
improve its performance for use as a sensor, or an electrode, or smart window …