Investigation of the interface state characteristics of the Al/Al2O3/Ge/p-Si heterostructure over a wide frequency range by capacitance and conductance measurements

B Akın, M Ulusoy, SA Yerişkin - Materials Science in Semiconductor …, 2024 - Elsevier
Abstract In this work, Al/Al 2 O 3/Ge/p-Si heterostructures were fabricated by e-beam thermal
evaporation. The EDX (energy dispersive X-ray spectroscopy) map visually obtained the …

Bridging the gap between surface physics and photonics

P Laukkanen, M Punkkinen, M Kuzmin… - Reports on Progress …, 2024 - iopscience.iop.org
Use and performance criteria of photonic devices increase in various application areas such
as information and communication, lighting, and photovoltaics. In many current and future …

Passivation of III–V surfaces with crystalline oxidation

P Laukkanen, MPJ Punkkinen, M Kuzmin… - Applied Physics …, 2021 - pubs.aip.org
Control of interfacial physicochemical properties associated with device materials to
minimize the impact of point defects on device performance has been a dominant theme in …

[HTML][HTML] A method for estimating defects in ferroelectric thin film MOSCAPs

AEO Persson, R Athle, J Svensson, M Borg… - Applied Physics …, 2020 - pubs.aip.org
We propose a capacitance measurement scheme that enables quantitative characterization
of ferroelectric thin films integrated on semiconductors. The film defect density is estimated …

Hydrogen passivation of oxygen vacancies in LaAlO3

M Choi - Current Applied Physics, 2022 - Elsevier
Through first-principles calculation using the screened hybrid functional, we investigate the
energetics and electronic structure of substitutional hydrogen (HO) in which one hydrogen …

A comprehensive gate and drain trapping/detrapping noise model and its implications for thin-dielectric MOSFETs

R Asanovski, P Palestri, E Caruso… - IEEE Transactions on …, 2021 - ieeexplore.ieee.org
We derive a complete set of expressions for the MOSFET gate and drain power spectral
densities due to elastic and inelastic trapping/detrapping of channel carriers into the gate …

Fluorine and related complexes in α-Al2O3

M Choi, CG Van de Walle - Journal of Applied Physics, 2023 - pubs.aip.org
Using first-principles calculations based on hybrid-density-functional theory, we examine the
energetics and electronic structure of fluorine in α-Al 2 O 3⁠. The F atom can be …

Evaluation of interface traps inside the conduction band of InAs-on-insulator nMOSFET by self-consistent Hall-QSCV method

K Sumita, K Toprasertpong, M Takenaka… - Applied Physics …, 2021 - pubs.aip.org
Interface trap density (D it) inside the conduction band of (111)-oriented InAs-on-insulator
(InAs-OI) n-channel metal-oxide-semiconductor field-effect-transistor (nMOSFET) was …

Effective passivation of p-and n-type In0. 53Ga0. 47As in achieving low leakage current, low interfacial traps, and low border traps

YHG Lin, HW Wan, LB Young, KH Lai, J Liu… - Journal of Applied …, 2024 - pubs.aip.org
We have attained low leakage current, low interfacial traps, and low border traps by
effectively passivating both p-and n-In0. 53Ga0. 47As (InGaAs) surfaces using the same …

Integration of ferroelectric hfo2 onto a iii-v nanowire platform

AEO Persson - 2023 - portal.research.lu.se
The discovery of ferroelectricity in CMOS-compatible oxides, such as doped hafnium oxide,
has opened new possibilities for electronics by reviving the use of ferroelectric …