Current status and nature of high-frequency electronegative plasmas: basis for material processing in device manufacturing

T Makabe - Japanese Journal of Applied Physics, 2019 - iopscience.iop.org
A non-equilibrium electronegative plasma serves as the reactive source for semiconductor
dry processing as an advanced technology. This paper reviews the current knowledge about …

A particle-in-cell/Monte Carlo simulation of a capacitively coupled chlorine discharge

S Huang, JT Gudmundsson - Plasma Sources Science and …, 2013 - iopscience.iop.org
Here we demonstrate the oopd1 (object-oriented plasma device for one dimension) particle-
in-cell/Monte Carlo simulation tool for a capacitively coupled chlorine discharge with a …

On the chemistry mechanism for low-pressure chlorine process plasmas

D Levko, LL Raja - Journal of Vacuum Science & Technology B, 2022 - pubs.aip.org
A chemical reaction mechanism of chlorine plasma under low-pressure conditions that is
widely used in the literature is validated against the experimental data of Y. Wang and JK …

Global (volume-averaged) model of inductively coupled chlorine plasma: influence of Cl wall recombination and external heating on continuous and pulse-modulated …

E Kemaneci, E Carbone, JP Booth… - Plasma Sources …, 2014 - iopscience.iop.org
An inductively coupled radio-frequency plasma in chlorine is investigated via a global
(volume-averaged) model, both in continuous and square wave modulated power input …

High sensitivity ultra-broad-band absorption spectroscopy of inductively coupled chlorine plasma

D Marinov, M Foucher, E Campbell… - Plasma Sources …, 2016 - iopscience.iop.org
We propose a method to measure the densities of vibrationally excited Cl 2 (v) molecules in
levels up to v= 3 in pure chlorine inductively coupled plasmas (ICPs). The absorption …

[PDF][PDF] Modelling of plasmas with complex chemistry: application to microwave deposition reactors

EH Kemaneci - 2014 - research.tue.nl
The main goal of this work is to gain a better understanding of a microwave deposition
plasma reactor that is used in the production of optical fibres. The plasma is formed in a …

Experimental and Numerical Characterization of Dielectric Barrier Discharge-Based Coaxial Kr/Cl Excilamp

S Bidawat, NK Sharma, M Singh… - … on Plasma Science, 2023 - ieeexplore.ieee.org
In this article, experimental and numerical characterization of a dielectric barrier discharge
(DBD)-based coaxial Kr/Cl2 excilamp excited by negative unipolar pulse has been carried …

Electron power absorption in electronegative capacitively coupled discharges

P Andrea - 2021 - opinvisindi.is
The aim of this work is to explore the role of electronegativity and the electron power
absorption mechanism in electronegative capacitively coupled oxygen and chlorine …

Measurement of electron swarm coefficients in chlorine and its mixtures with nitrogen

O González-Magaña, J De Urquijo - Plasma Sources Science …, 2018 - iopscience.iop.org
We have measured the electron drift velocity, density-normalized longitudinal diffusion and
effective ionization coefficients for electrons in Cl 2 and Cl 2–N 2 mixtures over the …

Vibrational excitation in O2and Cl2inductively-coupled plasmas and DC discharges

JP Booth, D Marinov, M Foucher… - APS Annual …, 2016 - ui.adsabs.harvard.edu
Low-energy electrons can interact with molecules via resonances to cause vibrational
excitation with large cross-sections. Such processes can absorb significant energy from the …