Assessing the environmental impact of atomic layer deposition (ALD) processes and pathways to lower it

M Weber, N Boysen, O Graniel, A Sekkat… - ACS Materials …, 2023 - ACS Publications
Due to concerns on resources depletion, climate change, and overall pollution, the quest
toward more sustainable processes is becoming crucial. Atomic layer deposition (ALD) is a …

Structural, optical, and electrical properties of copper oxide films grown by the silar method with post-annealing

WJ Lee, XJ Wang - Coatings, 2021 - mdpi.com
Copper oxides are widely used in photocatalysts, sensors, batteries, optoelectronic, and
electronic devices. In order to obtain different material properties to meet the requirements of …

Mechanistic insight into solution-based atomic layer deposition of CuSCN provided by in situ and ex situ methods

F Hilpert, PC Liao, E Franz, VM Koch… - … applied materials & …, 2023 - ACS Publications
Solution-based atomic layer deposition (sALD) processes enable the preparation of thin
films on nanostructured surfaces while controlling the film thickness down to a monolayer …

Achieving high tribological and corrosion performances via a new approach: Al2O3/CrN duplex coatings

X Guan, H Shi, M Zhao, G Zhang, Y Cao - Journal of Vacuum Science …, 2023 - pubs.aip.org
Owing to growth defects, the CrN coating–substrate system may suffer from severe corrosion
and wear attack in a marine environment, which limits the coating protection against the …

Photocatalytic membranes for oily wastewater treatment

G Nie, Y Bai, Y Xu, L Ye - Oil− Water Mixtures and Emulsions …, 2022 - ACS Publications
Photocatalytic degradation of organic pollutants has become a successful wastewater
treatment method in recent years, and scientists all over the globe are working to increase …

Solid‐State NMR Spectroscopic Investigation of TiO2 Grown on Silica Nanoparticles by Solution Atomic Layer Deposition

F Ding, CL Tavera Méndez, JP Grass… - Advanced Materials …, 2023 - Wiley Online Library
Atomic layer deposition in solution (sALD) is just emerging as a technology for the
preparation of thin films. Unlike ALD from the gas phase, it allows for mild reaction …

HfS 2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

Y Cao, S Zhu, J Bachmann - Dalton Transactions, 2021 - pubs.rsc.org
As a member of the two-dimensional metal dichalcogenide family, HfS2 has emerged as a
promising material for various optoelectronic applications. Atomic layer deposition is widely …

[PDF][PDF] Review Not peer-reviewed version

L Yeboah, AA Malik, P Oppong, P Acheampong… - 2024 - preprints.org
Wide-bandgap (WBG) semiconductors such as silicon carbide (SiC) and gallium nitride
(GaN) play a critical role in advancing high-power and high-frequency electronic …

[PDF][PDF] Molekulare Struktur von adsorbierten Monolagen an Fest-Flüssig-Grenzflächen

A Prihoda - 2023 - opus4.kobv.de
Die Struktur von adsorbierten dünnen Filmen an Fest-Flüssig-Grenzflächen ist für viele
wissenschaftliche Fragestellungen von großer Bedeutung. Unter anderem spielt die …

Catalytic Consequences of Catalyst Pellet Architecture on the Methanol to Oxymethylene Process

SMK Cook - 2023 - ir.lib.uwo.ca
A critical step for the synthesis of renewable oxy methyl ethers (OME) targeted towards
diesel substitution, is the catalytic production of a dimethoxymethane/formaldehyde mixture …