Atomic Layer Deposition: An Overview | Chemical Reviews ACS ACS Publications C&EN CAS
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Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Catalyst synthesis with precise control over the structure of catalytic active sites at the atomic
level is of essential importance for the scientific understanding of reaction mechanisms and …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …

Publisher Summary This chapter deals with atomic layer deposition (ALD), which is a
chemical gas phase thin film deposition method based on alternate saturative surface …

Atomic layer deposition (ALD) is used to deposit ruthenium− platinum nanostructured
catalysts using 2, 4-(dimethylpentadienyl)(ethylcyclopentadienyl) ruthenium, trimethyl …

The coating of complex three-dimensional structures with ultrathin metal films is of great
interest for current technical applications, particularly in microelectronics, as well as for basic …

Multi-keV X-ray microscopy has been particularly successful in bridging the resolution gap
between optical and electron microscopy. However, resolutions below 20 nm are still …

We have employed ptychographic coherent diffractive imaging to completely characterize
the focal spot wavefield and wavefront aberrations of a high-resolution diffractive X-ray lens …