High power pulsed magnetron sputtering (HPPMS) is an emerging technology that has
gained substantial interest among academics and industrials alike. HPPMS, also known as …

High power impulse magnetron sputtering (HiPIMS) has been at the center of attention over
the last years as it is an emerging physical vapor deposition (PVD) technology that …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

An extended structure zone diagram is proposed that includes energetic deposition,
characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high …

Excellent teaching and resource material... it is concise, coherently structured, and easy to
read... highly recommended for students, engineers, and researchers in all related fields." …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

The commonly used current-voltage characteristics are found inadequate for describing the
pulsed nature of the high power impulse magnetron sputtering (HIPIMS) discharge; rather …

Lead zirconate titanate (PZT) thin films stand for a prominent technological brick in the field
of microsystems. The recent improvements of their manufacturability combined with …

The ion to neutral ratio of the sputtered material have been studied for high power pulsed
magnetron sputtering and compared with a continuous direct current (dc) discharge using …

After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based
ion implantation and deposition (PBIID) can now be considered mature technologies for …