Ni‐Based Ohmic Contacts to n‐Type 4H‐SiC: The Formation Mechanism and Thermal Stability

AV Kuchuk, P Borowicz, M Wzorek… - … in Condensed Matter …, 2016 - Wiley Online Library
The fabrication of low‐resistance and thermal stable ohmic contacts is important for
realization of reliable SiC devices. For the n‐type SiC, Ni‐based metallization is most …

60–700 K CTAT and PTAT temperature sensors with 4H-SiC Schottky diodes

R Pascu, G Pristavu, G Brezeanu, F Draghici… - Sensors, 2021 - mdpi.com
A SiC Schottky dual-diode temperature-sensing element, suitable for both complementary
variation of VF with absolute temperature (CTAT) and differential proportional to absolute …

Comparison of nickel, cobalt, palladium, and tungsten Schottky contacts on n-4H-silicon carbide

VE Gora, A Chawanda, C Nyamhere, FD Auret… - Physica B: Condensed …, 2018 - Elsevier
We have investigated the current-voltage (IV) characteristics of nickel (Ni), cobalt (Co),
tungsten (W) and palladium (Pd) Schottky contacts on n-type 4 H-SiC in the 300–800 K …

[HTML][HTML] Characteristics of Ni-based ohmic contacts on n-type 4H-SiC using different annealing methods

Z Zhou, W He, Z Zhang, J Sun, A Schöner… - Nanotechnology and …, 2021 - pubs.aip.org
Nickel is an excellent ohmic-contact metal on 4H-SiC. This paper discusses the formation
mechanism of nickel ohmic contact on 4H-SiC by assessing the electrical properties and …

The thermal stability study and improvement of 4H-SiC ohmic contact

S Liu, Z He, L Zheng, B Liu, F Zhang, L Dong… - Applied Physics …, 2014 - pubs.aip.org
The thermal stability of the standard Ni/SiC and a TiW/Ni/SiC Ohmic contacts was
investigated and compared after being aged at 400 C in the N 2 atmosphere. The Ohmic …

Raman study of Ni and Ni silicide contacts on 4H–and 6H–SiC

S Cichoň, P Macháč, B Barda, V Machovič, P Slepička - Thin Solid Films, 2012 - Elsevier
Ni2Si, NiSi and NiSi2 contacts were prepared on n-type 4H–and 6H–SiC (0001) by
deposition of Ni and Si multilayers in the respective stoichiometry after high-temperature …

Low temperature, area-selective atomic layer deposition of NiO and Ni

HC Nallan, X Yang, BM Coffey… - Journal of Vacuum Science …, 2022 - pubs.aip.org
Nickel and nickel oxide are utilized within various device heterostructures for chemical
sensing, solar cells, batteries, etc. Recently, the rising interest in realizing low-cost, flexible …

A wafer-scale Ni-salicide contact technology on n-type 4H-SiC

H Elahipanah, A Asadollahi, M Ekström… - ECS Journal of Solid …, 2017 - iopscience.iop.org
A self-aligned Nickel (Ni) silicide process (Salicide) for n-type ohmic contacts on 4H-SiC is
demonstrated and electrically verified in a wafer-scale device process. The key point is to …

Origin of ohmic behavior in Ni, Ni2Si and Pd contacts on n-type SiC

B Barda, P Macháč, S Cichoň, V Machovič… - Applied Surface …, 2010 - Elsevier
Ni, Ni2Si and Pd contacts were prepared on n-type 4H-SiC and annealed in the temperature
range of 750–1150° C. The annealed contacts were analyzed before and after acid etching …

Low-resistance ohmic contacts to SiC nanowires and their applications to field-effect transistors

CO Jang, TH Kim, SY Lee, DJ Kim, SK Lee - Nanotechnology, 2008 - iopscience.iop.org
We report on the electrical characterization of two ohmic contacts (Ti/Au and Ni/Au) to
unintentionally doped silicon carbide nanowires (SiCNWs) using the modified transmission …