Split-gate Resurf Stepped Oxide (RSO) MOSFETs for 25V applications with record low gate-to-drain charge

P Goarin, GEJ Koops, R Van Dalen… - Proceedings of the …, 2007 - ieeexplore.ieee.org
This paper presents a split-gate version of the Resurf Stepped Oxide (RSO) MOSFET.
Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the …

Ultralow specific on-resistance high-voltage SOI lateral MOSFET

X Luo, J Fan, Y Wang, T Lei, M Qiao… - IEEE electron device …, 2010 - ieeexplore.ieee.org
An ultralow specific on-resistance (R on, sp) integrable silicon-on-insulator (SOI) power
lateral MOSFET is proposed. The MOSFET features double trenches: an oxide trench in the …

100 V class multiple stepped oxide field plate trench MOSFET (MSO-FP-MOSFET) aimed to ultimate structure realization

K Kobayashi, T Nishiguchi, S Katoh… - 2015 IEEE 27th …, 2015 - ieeexplore.ieee.org
For low-voltage power MOSFETs technology, Field Plate (FP) and Superjunction (SJ)
structures have been applied to reduce on-resistance drastically. As one of the approach for …

Industrialisation of resurf stepped oxide technology for power transistors

MA Gajda, SW Hodgskiss, LA Mounfield… - … Devices and IC's, 2006 - ieeexplore.ieee.org
The interaction of fabrication processes and device performance in RSO (resurf stepped
oxide) transistors is explored in this paper. Critical process steps for achieving good control …

100-V class two-step-oxide field-plate trench MOSFET to achieve optimum RESURF effect and ultralow on-resistance

K Kobayashi, H Kato, T Nishiguchi… - … Devices and ICs …, 2019 - ieeexplore.ieee.org
We propose a 100-V class two-step-oxide Field-Plate MOSFET (2-step FP-MOSFET), which
is formed by two steps of thick-oxide to simplify the structure and fabrication process. By …

Shield gate trench MOSFET with narrow gate architecture and low-k dielectric layer

Z Wang, M Qiao, D Fang, R Wang, Z Qi… - IEEE Electron …, 2020 - ieeexplore.ieee.org
A shield gate trench MOSFET (SGTMOS) featuring narrow gate (NG) architecture and low-k
dielectric layer (LDL), namely NL-SGTMOS, is proposed in this letter. By eliminating the …

250V integrable silicon lateral trench power MOSFETs with superior specific on-resistance

KR Varadarajan, TP Chow, J Wang… - Proceedings of the …, 2007 - ieeexplore.ieee.org
A lateral trench power MOSFET in the 250V class, with a reduced specific on-resistance is
proposed. Simulation results of an optimized device structure exhibits a low specific on …

Design optimization of multiple stepped oxide field plate trench MOSFETs with machine learning for ultralow on-resistance

H Gangi, Y Taguchi, K Nakata… - … Devices and ICs …, 2021 - ieeexplore.ieee.org
We propose a machine learning approach for power device design that consists of TCAD
simulation and line Bayesian optimization. It has the advantage of multivariable optimization …

High-performance split-gate-enhanced UMOSFET with dual channels

Y Wang, CH Yu, MS Li, F Cao… - IEEE Transactions on …, 2017 - ieeexplore.ieee.org
This paper presents an optimized split-gateenhanced trench MOSFET with dual channels
(DSGEUMOS). The 2-D device simulator ATLAS is used to investigate the characteristics of …

On-resistance limit estimation of 100 V-class field-plate trench power MOSFETs optimized oxide thickness

T Ogawa, W Saito, SI Nishizawa - IEEE Electron Device Letters, 2020 - ieeexplore.ieee.org
The on-resistance limit of 100 V-class Field-Plate (FP) trench power MOSFETs was
analyzed by TCAD simulation. In the previous works, the lateral pitch narrowing effect to …