High Power Impulse Magnetron Sputtering (HiPIMS) is a coating technology that combines
magnetron sputtering with pulsed power concepts. By applying power in pulses of high …

Magnetron sputtering deposition has become the most widely used technique for deposition
of both metallic and compound thin films and is utilized in numerous industrial applications …

Ever since they have been studied, gas discharges have been classified by their visual
appearance as well as by their current and voltage levels. Glow and arc discharges are the …

This paper provides perspectives on recent progress in understanding the physics of
devices in which the external magnetic field is applied perpendicular to the discharge …

Physical vapor deposition (PVD) refers to the removal of atoms from a solid or a liquid by
physical means, followed by deposition of those atoms on a nearby surface to form a thin …

Plasma-based physical vapor deposition (PVD) methods have found widespread use in
various industrial applications. In plasma-based PVD processes, the deposition species are …

Magnetron sputter epitaxy (MSE) is a promising processing route for group-III nitride
semiconductors, with the potential to enable high-quality and low cost GaN growth for …

The time-dependent plasma discharge ionization region model (IRM) has been under
continuous development during the past decade and used in several studies of the …

Regions of enhanced light emission rotating in the azimuthal direction are present in various
E× B plasma devices. A kinetic model reveals that these “rotating spokes” are due to …

High-power impulse magnetron sputtering is a deposition technique where a metal
magnetron target is sputtered in a high-density plasma to synthesise thin layers with …