Wet anisotropic etching based silicon micromachining is an important technique to fabricate
freestanding (eg cantilever) and fixed (eg cavity) structures on different orientation silicon …

Microelectromechanical systems (MEMS)-based sensors and actuators have become
remarkably popular in the past few decades. Rapid advances have taken place in terms of …

In wet bulk micromachining, the etching characteristics are orientation dependent. As a
result, prolonged etching of mask openings of any geometric shape on both Si {100} and Si …

This work presents the design and analysis of a micromachined ring-type motion sensor
which can sense both the yaw rate and linear acceleration of a device in that it is installed. It …

In the silicon wet etching process, the “pseudo-mask” formed by the hydrogen bubbles
generated during the etching process is the reason causing high surface roughness and …

Silicon wet anisotropic etching based bulk micromachining technique is widely used for the
fabrication of microelectromechanical systems components. In this technique of …

The aim of this work was to develop an alignment technique to be used in the production of
long, deep, large area microchannel devices. The microchannel design specifications used …

In this paper we propose a novel pre-etch method to determine the [100] direction on the
surface of⟨ 110⟩ silicon wafers with a diameter of 100 mm for precise bulk etching. A series …

In the silicon echelle grating fabrication process, the “pseudo-mask” formed by the hydrogen
bubbles generated during the etching process is the reason causing high surface roughness …

摘要单晶硅阶梯光栅闪耀面表面粗糙度会引起入射光的散射形成杂散光, 为获得低杂散光的阶梯
光栅槽形, 减小单晶硅阶梯光栅闪耀面表面粗糙度显得尤为重要. 在单晶硅湿法刻蚀工艺中 …