Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface
DA Buchberger Jr, DJ Hoffman, O Regelman… - US Patent …, 2007 - Google Patents
An overhead gas distribution electrode forming at least a portion of the ceiling of a plasma
reactor has a bottom Surface facing a processing Zone of the reactor. The elec trode …
reactor has a bottom Surface facing a processing Zone of the reactor. The elec trode …
Plasma processing apparatus
Y Yamazawa, C Koshimizu, M Saito, K Denpoh… - US Patent …, 2018 - Google Patents
A plasma processing apparatus includes a processing chamber including a dielectric
window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate …
window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate …
Flux focusing arrangement for permanent magnets, methods of fabricating such arrangements, and machines including such arrangements
JS Smith, R Pillsbury, B Sullivan - US Patent 8,400,038, 2013 - Google Patents
Related US Application Data(57) ABSTRACT (60) Provisional application No. 61/517,086,
filed on Apr. Numerous arrangements for permanent magnets are dis 13, 2011. closed that …
filed on Apr. Numerous arrangements for permanent magnets are dis 13, 2011. closed that …
Capacitively coupled plasma reactor with magnetic plasma control
DJ Hoffman, ML Miller, JG Yang, H Chae… - US Patent …, 2011 - Google Patents
A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a
vacuum chamber, and a workpiece support within the chamber and facing the ceiling for …
vacuum chamber, and a workpiece support within the chamber and facing the ceiling for …
Flux focusing arrangement for permanent magnets, methods of fabricating such arrangements, and machines including such arrangements
JS Smith, R Pillsbury, B Sullivan - US Patent 8,397,369, 2013 - Google Patents
Numerous arrangements for permanent magnets are disclosed that can focus the flux
produced by the magnets. Depending on the particular application in which the disclosed …
produced by the magnets. Depending on the particular application in which the disclosed …
Flux focusing arrangement for permanent magnets, methods of fabricating such arrangements, and machines including such arrangements
JS Smith, R Pillsbury, BJ Sullivan - US Patent 10,242,783, 2019 - Google Patents
Numerous arrangements for permanent magnets are dis closed that can focus the flux
produced by the magnets. Depending on the particular application in which the dis closed …
produced by the magnets. Depending on the particular application in which the dis closed …
Flux focusing arrangement for permanent magnets, methods of fabricating such arrangements, and machines including such arrangements
JS Smith, R Pillsbury, BJ Sullivan - US Patent 9,269,483, 2016 - Google Patents
Numerous arrangements for permanent magnets are disclosed that can focus the flux
produced by the magnets. Depending on the particular application in which the disclosed …
produced by the magnets. Depending on the particular application in which the disclosed …
Devices and methods for magnetic flux return optimization in electromagnetic machines
BJ Sullivan - US Patent 9,899,886, 2018 - Google Patents
A rotor element configured for movement relative to a stator includes a backing member
formed, at least in part, from a ferromagnetic material; a first magnetic pole having a first …
formed, at least in part, from a ferromagnetic material; a first magnetic pole having a first …
Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer …
DJ Hoffman - US Patent 7,521,370, 2009 - Google Patents
A plasma reactor chamber is characterized by performing the following steps:(a) for each
one of the chamber parameters, ramping the level of the one chamber parameter while …
one of the chamber parameters, ramping the level of the one chamber parameter while …
Dual bias frequency plasma reactor with feedback control of ESC voltage using wafer voltage measurement at the bias supply output
JG Yang, DJ Hoffman, SC Shannon, DH Burns… - US Patent …, 2008 - Google Patents
A plasma reactor has a dual frequency plasma RF bias power supply furnishing RF bias
power comprising first and second frequency components, f (1), f (2), respectively, and an …
power comprising first and second frequency components, f (1), f (2), respectively, and an …