Analysis of III-V material-based dual source T-channel junction-less TFET with metal implant for improved DC and RF performance

A Anam, SI Amin, D Prasad, N Kumar, S Anand - Micro and Nanostructures, 2023 - Elsevier
In this paper, two III-V material-based junctionless tunnel FET devices, D-1 and D-2, are
proposed. The proposed device D-1 has a low bandgap (GaSb-based) dual source and a …

Investigation of Si1−XGeX source dual material stacked gate oxide pocket doped hetero-junction TFET for low power and RF applications

Dharmender, KK Nigam, P Yadav… - International Journal of …, 2024 - Taylor & Francis
In this paper, the applicability of dual material stacked gate-oxide-Pocket doped-hetero-
junction tunnel field effect transistor (DMSGO-PD-HTFET) for low power switching and radio …

Improvement of electrical performance in heterostructure junctionless TFET based on dual material gate

H Xie, H Liu, S Wang, S Chen, T Han, W Li - Applied Sciences, 2019 - mdpi.com
In this paper, a dual metallic material gate heterostructure junctionless tunnel field-effect
transistor (DMMG-HJLTFET) is proposed and investigated. We use the Si/SiGe …

Junctionless tunnel field-effect transistor with a modified auxiliary gate, a novel candidate for high-frequency applications

IC Cherik, A Abbasi, SK Maity, S Mohammadi - Micro and Nanostructures, 2023 - Elsevier
In this paper, we propose a novel junctionless tunnel field-effect transistor that uses a
tunneling gate and a modified auxiliary gate. The first one is employed to enhance the …

Use of metal strip in stacked gate oxide JLTFET improves device quality and single-event-transient effect

A Vanak, A Amini - Materials Science and Engineering: B, 2024 - Elsevier
This study represents a stacked gate oxide junctionless tunneling field effect transistor
(JLTFET) which has metal strips in gate oxide layers. The metal strips make improvement in …

Effect of ambipolarity suppression in PNPN TFET with dopant segregated Schottky-drain technique

A Anam, SI Amin, D Prasad, N Kumar, S Anand - Microelectronics Journal, 2024 - Elsevier
In this paper, a comparative analysis of ambipolarity suppression in conventional PNPN-
TFET (D-1) is studied using TCAD simulation. By replacing the drain with metal silicide, and …

Impact of metal silicide source electrode on polarity gate induced source in junctionless TFET

J Madan, R Pandey, R Sharma, R Chaujar - Applied Physics A, 2019 - Springer
Abstract Tunnel Field Effect Transistors (TFET) based on quantum mechanical band to band
tunneling (BTBT) are promising alternatives for low power analog applications. Additionally …

A theoretical investigation of mole fraction-based N+ pocket doped stack oxide TFET considering ideal conditions for reliability issues

KK Nigam - Microelectronics Reliability, 2024 - Elsevier
Nowadays, reliability towards the interface trap charges of the semiconductor device is a
major grave concern. Therefore, we introduce, for the first time, a theoretical investigation of …

Investigation of RF and linearity performance of electrode work‐function engineered HDB vertical TFET

S Narwal, SS Chauhan - Micro & Nano Letters, 2019 - Wiley Online Library
This work realises a hetero‐dielectric buried oxide vertical tunnel field effect transistor (HDB
VTFET) and investigates its radio frequency (RF) and linearity characteristics. First time, the …

A new design approach to improve DC, analog/RF and linearity metrics of vertical TFET for RFIC design

SS Chauhan - Superlattices and Microstructures, 2018 - Elsevier
This paper presents a novel design of Vertical Tunnel Field Effect Transistor (VTFET) using
work-function engineering. In this work, we investigate the impact of work-function …