Synthesis and self-assembly of polystyrene block polyacrylic acid for sub 10 nm feature size
To promote lithography in the semiconductor industry, self-assembling block copolymers are
the most feasible and cost-effective option. To address the challenges of the semiconductor …
the most feasible and cost-effective option. To address the challenges of the semiconductor …
New materials for directed self-assembly for advanced patterning
J Zhang, J Wu, M Li, VV Ginzburg… - Advances in …, 2014 - spiedigitallibrary.org
Directed Self-Assembly (DSA) of block copolymers is a candidate advanced patterning
technology at future technology nodes. Although DSA promises resolution and cost benefits …
technology at future technology nodes. Although DSA promises resolution and cost benefits …
Understanding and mitigating bridge defects in block copolymer directed self-assembly through computational materials design and optimization
JB Delony, PJ Ludovice… - Advances in Patterning …, 2020 - spiedigitallibrary.org
Block copolymers (BCPs) are appealing materials to the lithography community because of
their potential to extend Moore's Law beyond the 10nm node. Not only do BCPs have the …
their potential to extend Moore's Law beyond the 10nm node. Not only do BCPs have the …