Modification of Steel Surfaces with Nanometer Films of Al2O3 and TiO2 Decreases Interfacial Adhesion to Polymers: Implications for Demolding Shape-Engineered …

MJ Lima, RM Silva, K Gonzalez, JD Castro… - ACS Applied Nano …, 2021 - ACS Publications
Alumina (Al2O3) and titanium dioxide (TiO2) thin films were deposited by the atomic layer
deposition technique on steel substrates used in the polymer injection molding industry. The …

[HTML][HTML] Diffusion of dilute gas in arrays of randomly distributed, vertically aligned, high-aspect-ratio cylinders

W Szmyt, C Guerra, I Utke - Beilstein journal of …, 2017 - beilstein-journals.org
In this work we modelled the diffusive transport of a dilute gas along arrays of randomly
distributed, vertically aligned nanocylinders (nanotubes or nanowires) as opposed to gas …

Enhanced performances of polypropylene membranes by molecular layer deposition of polyimide

S Xiong, T Sheng, L Kong, Z Zhong, J Huang… - Chinese Journal of …, 2016 - Elsevier
Molecular layer deposition (MLD) for the deposition of polyimide (PI) at low temperature of
110° C has been firstly introduced into the field of membrane separation. With the optimized …

Uniform coating of Ta2O5 on vertically aligned substrate: A prelude to forced flow atomic layer deposition

M Mishra, CC Kei, YH Yu, WS Liu… - Review of Scientific …, 2017 - pubs.aip.org
Uniform tantalum oxide thin films, with a growth rate of 0.6 Å/cycle, were fabricated on
vertically aligned, 10 cm-long, silicon substrates using an innovative atomic layer deposition …

Forced flow atomic layer deposition of TiO2 on vertically aligned Si wafer and polysulfone fiber: Design and efficacy of conduit plates and soak function

M Mishra, CY Chan, CC Kei, YC Yen… - Review of Scientific …, 2018 - pubs.aip.org
The effectiveness of three different designs of conduit plates was verified for even
distribution of precursors in a voluminous forced-flow atomic layer deposition (ALD) …

Highly conductive mesoporous hierarchical carbon hollow fibers fabricated via confinement of TiO2 coating by ALD

TK Chin, MW Liao, TP Perng - Journal of the American Ceramic …, 2022 - Wiley Online Library
A polysulfone (PSF) hollow fiber composed of interconnected nanofibers within its wall was
employed as a template to deposit with a layer of TiO2 by atomic layer deposition. Direct …

[PDF][PDF] Titre

S Woodward-Gagné - 2019 - publications.polymtl.ca
Le dépôt par couche atomique (ALD) est un type de dépôt chimique en phase vapeur (CVD)
dans lequel la croissance se produit par monocouches atomiques successives. La méthode …

[图书][B] Tailoring Absorption in Optical Thin Films Using Atomic Layer Deposition of High Quality Titanium Nitride

S Woodward-Gagné - 2019 - search.proquest.com
Atomic layer deposition (ALD) is a type of chemical vapour deposition (CVD) in which
growth occurs though successive atomic monolayers. The method is of great interest for …