New development of atomic layer deposition: processes, methods and applications
Atomic layer deposition (ALD) is an ultra-thin film deposition technique that has found many
applications owing to its distinct abilities. They include uniform deposition of conformal films …
applications owing to its distinct abilities. They include uniform deposition of conformal films …
Developments in the application of nano materials for photovoltaic solar cell design, based on industry 4.0 integration scheme
Nano materials now have vast relevance and application in product design, such as power
generation systems. This paper focuses on ongoing research involving Nickel Oxide …
generation systems. This paper focuses on ongoing research involving Nickel Oxide …
Fabrication and synthesis of SnOX thin films: a review
Due to its exceptional electrical, optical, chemical and magnetic properties, tin oxide (SnO
and SnO 2), which is a functional material, has gained enormous attention for use in a …
and SnO 2), which is a functional material, has gained enormous attention for use in a …
Multiscale CFD modeling of area-selective atomic layer deposition: Application to reactor design and operating condition calculation
Area-selective atomic layer deposition (ASALD) as a bottom-up nanopatterning technique
has gained recognition for its ability to address misalignment issues in semiconductor …
has gained recognition for its ability to address misalignment issues in semiconductor …
Multiscale computational fluid dynamics modeling of thermal atomic layer etching: Application to chamber configuration design
Atomic layer etching (ALE) is a promising method that can overcome the challenges that are
encountered during the assembly of nanoscale devces. Experiments may be conducted to …
encountered during the assembly of nanoscale devces. Experiments may be conducted to …
Multiscale computational fluid dynamics modeling of spatial thermal atomic layer etching
Spatial atomic layer deposition and etching processes have emerged to reduce the overall
process time while maintaining the conformity of thin films by functioning continuously. This …
process time while maintaining the conformity of thin films by functioning continuously. This …
Progress in enhanced fluidization process for particle coating via atomic layer deposition
Coated nanoparticles have a wide range of potential applications due to their unique
physical, chemical or biological properties. Fluidized bed atomic layer deposition (FB-ALD) …
physical, chemical or biological properties. Fluidized bed atomic layer deposition (FB-ALD) …
Investigating atomic layer deposition characteristics in multi-outlet viscous flow reactors through reactor scale simulations
In order to minimize the operational time of atomic layer deposition (ALD) process, flow
transports and film depositions are investigated in multi-outlet viscous flow reactors through …
transports and film depositions are investigated in multi-outlet viscous flow reactors through …
Numerical simulation of atomic layer deposition for thin deposit formation in a mesoporous substrate
ZnO deposition in porous γ‐Al2O3 via atomic layer deposition (ALD) is the critical first step
for the fabrication of zeolitic imidazolate framework membranes using the ligand‐induced …
for the fabrication of zeolitic imidazolate framework membranes using the ligand‐induced …
A numerical approach on the selection of the purge flow rate in an atomic layer deposition (ALD) process
The variation of the purge flow rate is investigated in a reactor scale simulation of a typical
atomic layer deposition (ALD) process. The investigation in its context addresses the …
atomic layer deposition (ALD) process. The investigation in its context addresses the …