Abstract Titanium nitride (TiN), Titanium aluminum nitride (TiAlN), and Titanium aluminum
silicon nitride (TiAlSiN) coatings were deposited over Silicon (Si)(100) substrates using …

Mechanical manufacturing processes aim to transform metallic materials into mechanical
parts and components. In these processes, tools are used for cutting, punching and …

Titanium nitride (TiN) films have been used as gate electrodes in metal–oxide-
semiconductor (MOS) capacitors, which were fabricated with SiO2 layer as gate dielectric …

In this study, the structural and stoichiometric properties of titanium nitride films deposited by
cathodic cage plasma deposition (CCPD) and DC magnetron sputtering (MS) are compared …

This paper considers the modern level of technique, research, and application of “plasma
focus” facilities in the countries of Asia, Africa, and Latin America. A description of the …

The aim of this work is to investigate the effect of titanium nitride coating for various treatment
times (0.5–4 h) by cathodic cage plasma deposition (CCPD) on surface properties of AISI D6 …

Utilizing a plasma focus (PF) instrument, magnesium nitride (Mg3N2) thin films were
synthesized on stainless steel substrates. Twenty five optimum focus shots at 8 cm distance …

Expanded austenite can be generated on austenitic stainless steels either by ion carburizing
or ion nitriding. In both cases the resulting fcc crystal structure, supersaturated with nitrogen …

A 2.8 kJ plasma focus device with a nitrogen gas filling and a copper anode capsulated by
aluminum was used to modify the surface of AISI304 steel substrate, in order to improve its …

Numerical experiments have been systematically carried out using the modified Lee model
code on various plasma focus devices operated with nitrogen gas. The ion beam properties …