Impact of N2O Plasma Reactant on PEALD-SiO2 Insulator for Remarkably Reliable ALD-Oxide Semiconductor TFTs
DG Kim, KS Yoo, HM Kim… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
We studied nitrogen (N) incorporation effects on the electrical characteristics of SiO 2
fabricated by plasma-enhanced atomic layer deposition (PEALD). To determine whether N …
fabricated by plasma-enhanced atomic layer deposition (PEALD). To determine whether N …
Nitrogen Nanobubbles in a-SiOxNy Coatings: Evaluation of Its Physical Properties and Chemical Bonding State by Spatially Resolved Electron Energy-Loss …
B Lacroix, V Godinho, A Fernandez - The Journal Of Physical …, 2016 - ACS Publications
Nanoporous silicon-based materials with closed porosity filled with the sputtering gas have
been recently developed by magnetron sputtering. In this work the physical properties …
been recently developed by magnetron sputtering. In this work the physical properties …
Tunable emission from Eu: SiOxNy thin films prepared by integrated magnetron sputtering and plasma enhanced chemical vapor deposition
This paper reports tunable emission of trivalent (Eu 3+) and divalent (Eu 2+) europium (Eu)
from SiO x N y films fabricated by integrated electron cyclotron plasma enhanced chemical …
from SiO x N y films fabricated by integrated electron cyclotron plasma enhanced chemical …
Harnessing second-order optical nonlinearities at interfaces in multilayer silicon-oxy-nitride waveguides
DF Logan, AB Alamin Dow, D Stepanov… - Applied Physics …, 2013 - pubs.aip.org
We demonstrate multi-layer silicon-oxy-nitride (SiON) waveguides as a platform for
broadband tunable phase-matching of second-order nonlinear interactions arising at …
broadband tunable phase-matching of second-order nonlinear interactions arising at …
P‐2: Nitrogen Behaviors in PEALD‐Grown SiO2 Films Using N2O Plasma Reactant and Its Application in ALD‐IZO TFTs
DG Kim, KS Yoo, HM Kim… - SID Symposium Digest of …, 2022 - Wiley Online Library
We studied nitrogen (N) behaviors in plasma‐enhanced atomic layer deposition (PEALD)‐
grown silicon dioxide (SiO2) using nitrous oxide (N2O) plasma reactant. The gradually …
grown silicon dioxide (SiO2) using nitrous oxide (N2O) plasma reactant. The gradually …