[HTML][HTML] Review of nanostructured devices for thermoelectric applications

G Pennelli - Beilstein journal of nanotechnology, 2014 - beilstein-journals.org
A big research effort is currently dedicated to the development of thermoelectric devices
capable of a direct thermal-to-electrical energy conversion, aiming at efficiencies as high as …

Nanowires: A route to efficient thermoelectric devices

F Domínguez-Adame, M Martín-González… - Physica E: Low …, 2019 - Elsevier
Miniaturization of electronic devices aims at manufacturing ever smaller products, from
mesoscopic to nanoscopic sizes. This trend is challenging because the increased levels of …

Investigation of silicon nanowire gate-all-around junctionless transistors built on a bulk substrate

DI Moon, SJ Choi, JP Duarte… - IEEE transactions on …, 2013 - ieeexplore.ieee.org
A silicon nanowire (Si-NW) with a gate-all-around (GAA) structure is implemented on a bulk
wafer for a junctionless (JL) field-effect transistor (FET). A suspended Si-NW from the bulk-Si …

Configurable logic gates using polarity-controlled silicon nanowire gate-all-around FETs

M De Marchi, J Zhang, S Frache… - IEEE Electron …, 2014 - ieeexplore.ieee.org
This letter demonstrates the first fabricated four-transistor logic gates using polarity-
configurable, gate-all-around silicon nanowire transistors. This technology enhances …

Thermal Atomic Layer Etching of Silicon Using O2, HF, and Al(CH3)3 as the Reactants

AI Abdulagatov, SM George - Chemistry of Materials, 2018 - ACS Publications
Thermal atomic layer etching (ALE) of silicon was performed using O2, HF, and Al (CH3) 3
as the reactants at temperatures from 225 to 290° C. This thermal etching process is based …

Silicon and germanium nanowire electronics: physics of conventional and unconventional transistors

WM Weber, T Mikolajick - Reports on Progress in Physics, 2017 - iopscience.iop.org
Research in the field of electronics of 1D group-IV semiconductor structures has attracted
increasing attention over the past 15 years. The exceptional combination of the unique 1D …

Ultimate vertical gate-all-around metal–oxide–semiconductor field-effect transistor and its three-dimensional integrated circuits

S Ye, K Yamabe, T Endoh - Materials Science in Semiconductor Processing, 2021 - Elsevier
Abstract According to the International Roadmap for Devices and Systems, gate-all-around
(GAA) metal–oxide–semiconductor field-effect transistors (MOSFETs) will become the main …

Design and performance analysis of cylindrical surrounding double-gate MOSFET for RF switch

VM Srivastava, KS Yadav, G Singh - Microelectronics Journal, 2011 - Elsevier
In this paper, we have analyzed the design parameters of Cylindrical Surrounding Double-
Gate (CSDG) MOSFETs as an RF switch for the advanced wireless telecommunication …

Study of selective isotropic etching Si1−xGex in process of nanowire transistors

J Li, W Wang, Y Li, N Zhou, G Wang, Z Kong… - Journal of Materials …, 2020 - Springer
On approach towards the end of technology roadmap, a revolutionary approach towards the
nanowire transistors is favorable due to the full control of carrier transport. The transistor …

Mechanisms of plasticity in near-theoretical strength sub-100 nm Si nanocubes

AJ Wagner, ED Hintsala, P Kumar, WW Gerberich… - Acta Materialia, 2015 - Elsevier
Silicon is one of the most technologically important materials, used extensively in
electronics, solar cells, micro-electro-mechanical systems (MEMS) based devices and more …