Over the last few decades there has been a huge interest in nanostructured functional
materials and assembly techniques for preparing functional molecular assemblies with …

Atomic layer deposition (ALD) is gaining attention as a thin film deposition method, uniquely
suitable for depositing uniform and conformal films on complex three-dimensional …

Passive daytime radiative cooling, which is a process that removes excess heat to cold
space as an infinite heat sink, is an emerging technology for applications that require …

Atomic layer deposition (ALD) is an attractive method to deposit thin films for advanced
technological applications such as microelectronics and nanotechnology. One material …

Atomic layer deposition (ALD), a chemical vapor deposition technique based on sequential
self-terminating gas–solid reactions, has for about four decades been applied for …

The ever increasing requirements for electrical performance of on-chip wiring has driven
three major technological advances in recent years. First, copper has replaced Aluminum as …

In order to employ Li-ion batteries LIBs in next-generation hybrid electric andor plug-in
hybrid electric vehicles HEVs and PHEVs, LIBs must satisfy many requirements electrodes …

Atomic layer deposition (ALD) is a process for depositing highly uniform and conformal thin
films by alternating exposures of a surface to vapours of two chemical reactants. ALD …

The aim of the present contribution is to give a review on the recent work concerning Cd‐
free buffer and window layers in chalcopyrite solar cells using various deposition techniques …

Atomic layer deposition, formerly called atomic layer epitaxy, was developed in the 1970s to
meet the needs of producing high-quality, large-area fl at displays with perfect structure and …