Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high‐
throughput patterning of polymer nanostructures at great precision and at low costs. Unlike …

Inorganic-based micro light-emitting diodes (microLEDs) offer more fascinating properties
and unique demands in next-generation displays. However, the small size of the microLED …

Nano-imprint lithography (NIL) is one of the most promising patterning technologies, in
which nano-and micro-patterns are fabricated on various substrates. NIL provides high …

Nanoimprint lithography is a potentially low-cost, high-resolution patterning technique, but
most of the surrounding development work has been directed toward tool designs and …

Three-dimensional diamond-like carbon mold fabricated by focused-ion-beam chemical
vapor deposition (FIB–CVD) using a precursor of phenanthrene has been applied to a …

Methacrylate octafunctionalized silsesquioxane (SSQMA) was shown to be an ideal material
with high performance for ultraviolet (UV)-based nanoimprint lithography (NIL). The total …

Nano and micro-patterns (dual patterns) were introduced on a glass substrate as an
extraction layer to enhance the light extraction efficiency of white organic light-emitting …

Diamond-like carbon (DLC) films, used as molds for nanoimprint lithography, were treated
with a fluorocarbon-based plasma in order to enhance their anti-adhesion properties. While …

Three-dimensional diamond-like carbon (DLC) mold fabricated by focused-ion-beam
chemical vapor deposition (FIB-CVD) using a precursor of phenanthrene has been applied …

A compact nanoimprint lithography (NIL) apparatus using the driving power of a servomotor
has been newly developed. A bilayer resist method using hydrogen silsequioxane (HSQ) as …