As a non-toxic and non-polluting semiconductor material, Mg2Si/Si has great potential for
application in the field of visible and near-infrared photo detection due to its excellent …

Abstract Magnesium silicide (Mg 2 Si) thick films with (110) orientation were fabricated on
(001) sapphire substrate using radiofrequency magnetron sputtering. Stoichiometric Mg 2 Si …

Mg 2 Si thin and ultra-thin films are grown on silicon (Si) substrates by performing heat
treatments of Magnesium (Mg) layers deposited on Si (100), using radio frequency (RF) …

The ongoing miniaturization of thermoelectric (TE) modules requires scaling down to thin
films of TE materials with high efficiency. Moreover, thin film-based integrated devices …

and (111)‐oriented Mg2Si films were grown at 325° C on (100) and (110), and (111) SrTiO3
substrates, respectively, by RF magnetron sputtering method. X‐ray pole figure …

oriented epitaxial Mg 2 Si films were grown on (100),(110), and (111) MgO single crystals by
RF magnetron sputtering. Two, one, and three types of in-plane variants were observed for …

Abstract Conformal compact Mg 2 Si films can be formed on Si substrates (for battery,
photovoltaic, thermoelectric, or other applications) via the direct reaction of Mg films with …

Polycrystalline Si powder consisting of micro-porous particles was prepared by heating
Mg2Si powder at 600° C for 40h under a pressure of 500Pa. The porous Si particles were …

Abstract Magnesium silicide (Mg2Si) is an attractive semiconductor material for application
to thermo‐electric conversion devices because it consists of non‐toxic and resource …

In this work, room temperature co-deposition of Mg and Si was used to successfully fabricate
Mg2Si thin films on Si substrate by dual cathode magnetron sputtering (DCMS). Films were …