Formation of Strong Boron Lewis Acid Sites on Silica

KK Samudrala, MO Akram, JL Dutton… - Inorganic …, 2024 - ACS Publications
Bis (1-methyl-ortho-carboranyl) borane (HBMe o Cb2) is a very strong Lewis acid that reacts
with the isolated silanols present on silica partially dehydroxylated at 700° C (SiO2-700) to …