A systematic review, covering fabrication of nanoscale patterns by laser interference
lithography (LIL) and their applications for optical devices is provided. LIL is a patterning …

An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous
template was investigated for the reduction of air trapping and template damage caused by …

Copper interconnects have gained wide acceptance in the microelectronics industry due to
improved resistivity and reliability compared to Al interconnects. Initially SiO 2 was used as …

We have demonstrated an organic solvent-free water-developable branched sugar resist
material derived from biomass for its use in green electron beam lithography. This …

An electron beam (EB) lithography method using inedible cellulose-based resist material
derived from woody biomass has been successfully developed. This method allows the use …

Nanoimprint lithography is a newly developed patterning method that employs a hard
template for the patterning of structures at micro-and nanometer scales. This technique has …

We investigated electron beam (EB) lithography using a novel highly sensitive negative type
of plant-based resist material derived from biomass on a hardmask layer for trilayer …

Plant-based materials have recently been used as eco-friendly, water-repellent, light-
transparent films for liquid crystal displays and optical devices. An approach using an eco …

The application of natural linear polysaccharide to green resist polymers was demonstrated
for electron beam (EB) and extreme-ultraviolet (EUV) lithography using organic-solvent-free …

From the viewpoints of the utilization of agricultural resources and advanced use of biomass,
this study is aimed at expanding the resolution limits of ecofriendly ethanol-developable …