A comprehensive review on FinFET in terms of its device structure and performance matrices

MN Reddy, DK Panda - Silicon, 2022 - Springer
The revolutions made in the CMOS technology are brought up by, continuous downscaling
in order to obtain higher density, better performance and low power consumption, causing …

A Perspective View of Silicon Based Classical to Non-Classical MOS Transistors and their Extension in Machine Learning

AP Singh, VK Mishra, S Akhter - Silicon, 2023 - Springer
Unprecedented growth in CMOS technology and demand of high-density integrated circuits
(ICs) in semiconductor industry has motivated to research community towards the …

Design optimization of three-stacked nanosheet FET from self-heating effects perspective

S Rathore, RK Jaisawal, PN Kondekar… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
Self-heating effect (SHE) is a severe issue arising in the nanoscale field-effect transistors
(FETs). It raises the device's lattice temperature several degrees higher than the ambient …

Impact of scaling on nanosheet FET and CMOS circuit applications

NA Kumari, VB Sreenivasulu… - ECS Journal of Solid State …, 2023 - iopscience.iop.org
In this paper, the impact of scaling on the gate all around the nanosheet field effect transistor
(GAA NSFET) is assessed in detail at sub-5-nm nodes for digital and analog/RF …

Trap and self-heating effect based reliability analysis to reveal early aging effect in nanosheet FET

S Rathore, RK Jaisawal, PN Kondekar, N Bagga - Solid-State Electronics, 2023 - Elsevier
The reliability of the CMOS devices is severely affected due to the presence of interface (S
i/S i O 2) trap charges and self-heating effect (SHE). In this paper, we investigated the trap …

RF with linearity and non-linearity parameter analysis of gate all around negative capacitance junction less FET (GAA-NC-JLFET) for different ferroelectric thickness

P Raut, U Nanda, DK Panda - Physica Scripta, 2022 - iopscience.iop.org
Abstract A novel Gate All Around Negative Capacitance Junction less FET (GAA-NC-JLFET)
is proposed in this work, where different RF/Analog, Linear, and Non-linear parameters were …

Role of temperature on linearity and analog/RF performance merits of a negative capacitance FinFET

RK Jaisawal, S Rathore, N Gandhi… - Semiconductor …, 2022 - iopscience.iop.org
Temperature plays a decisive role in semiconductor device performance and reliability
analysis. The effect is more severe in a negative capacitance (NC) transistor, as the …

Reliability of TCAD study for HfO2-doped Negative capacitance FinFET with different Material-Specific dopants

RK Jaisawal, S Rathore, PN Kondekar, N Bagga - Solid-State Electronics, 2023 - Elsevier
Attaining the ferroelectric (FE) polarization in a thin HfO 2 layer using a specific dopant is a
widely adopted way to realize Negative Capacitance (NC) FET. In a general TCAD …

Investigation of self-heating effect in tree-FETs by interbridging stacked nanosheets: a reliability perspective

S Srivastava, M Shashidhara… - IEEE Transactions on …, 2022 - ieeexplore.ieee.org
This work comprehensively investigates the self-heating effects (SHEs) in Tree-FET at 5nm
technological nodes. A comparative analysis of Tree-FET with Nanosheet FET (NSFET) …

Performance optimization of tri-gate junctionless FinFET using channel stack engineering for digital and analog/RF design

D Singh, S Chaudhary, B Dewan… - Journal of …, 2023 - iopscience.iop.org
This manuscript explores the behavior of a junctionless tri-gate FinFET at the nano-scale
region using SiGe material for the channel. For the analysis, three different channel …