The evolution of silicon cryoetching is reported in this topical review, from its very first
introduction by a Japanese team to today's advanced technologies. The main advances in …

In this review, we discuss the progress of emerging dry processes for nanoscale fabrication.
Experts in the fields of plasma processing have contributed to addressing the increasingly …

Production of high-aspect-ratio silicon (Si) nanowire-based anode for lithium ion batteries is
challenging particularly in terms of controlling wire property and geometry to improve the …

Silicon presents a very high theoretical capacity (3578 mAh/g) and appears as a promising
candidate for the next generation of negative electrodes for Li-ion batteries. An important …

4-(Trimethylsiloxy)-3-pentene-2-one (TMSPO) is tested as an electrolyte additive to enhance
Coulombic efficiency and cycle retention for the Li/LiNi0. 5Mn1. 5O4 (LNMO) half-cell and …

Area-selective atomic layer deposition (AS-ALD) is attracting increasing interest because of
its ability to enable both continued dimensional scaling and accurate pattern placement for …

In this article, we give an overview about the chemical and physical processes that play a
role in etching at lower wafer temperatures. Conventionally, plasma etching processes rely …

To overcome mass transfer limitation and adjust zeolite's acidity, the modification of beta
zeolite via etching with hydrofluoric acid/ammonium fluoride (HF/NH 4 F) solution was …

Fluorine cold plasmas produced by an electrical discharge in SF 6, CF 4, CHF 3 or C 4 F 8
gases, principally, have two main fields of application. The first and historical application is …

The cryogenic plasma etching of silicon for nano-and microelectromechanical devices is
known to show an optimal operating temperature around–100° C. The physicochemical …