Optoelectronics and photocatalysis are two rapidly developing photonic fields that are
revolutionizing green energy, medicine, communications, and robotics. To advance these …

The state-of-the-art CMOS technology has started to adopt three-dimensional (3D)
integration approaches, enabling continuous chip density increment and performance …

Pulsed laser annealing is one of the promising low thermal budget approaches to overcome
process limitations and develop alternative schemes to achieve better device performance …

Ultraviolet nanosecond laser annealing (LA) is a powerful tool where strongly confined
heating and melting are desirable. In semiconductor technologies the importance of LA …

Abstract Three-dimensional (3D) CMOS technology encourages the use of UV laser
annealing (UV-LA) because the shallow absorption of UV light into materials and the …

Nickel silicidation reactions were activated on 4H-SiC using laser annealing at wavelength
of 308 nm to study interaction and reaction of the involved atomic species. With this intent …

Photo-detection in the near-infrared is commonly performed by Ge or InGaAs-based
photodetectors. Further extension of the detection range to the mid-infrared region can be …

The feasibility of dopant activation surpassing the equilibrium solid solubility limit by using
an out of equilibrium melt laser annealing (MLA) process was investigated. To that end, we …

UV nanosecond pulsed laser annealing (UV-NLA) is demonstrating clear benefits in the
emerging 3D-integrated electronic devices, where the allowed thermal budget is strictly …

Positron annihilation was used to probe vacancy-type defects in electrodeposited Cu films
after nanosecond pulse laser annealing. For the as-deposited Cu film, we identified the …