Nanoimprint lithography (NIL) is a cost-effective and high-throughput technique for
replicating nanoscale structures that does not require expensive light sources for advanced …

DOI: 10.1002/adma. 201505552 these NIL methods is material shrinkage, either upon
solvent evaporation, cooling, or during curing steps. Azobenzene chromophores possess …

Nanoimprint lithography is a low cost and high throughput technology to fabricate
nanostructures with excellent resolution. However, traditional thermal nanoimprint limits its …

Hydrolyzed hyaluronic acid high-resolution fine microneedles of 13 µm in diameter and 24
µm in height were fabricated from hydrolyzed hyaluronic acid gels made in mixtures of water …

UV-nanoimprint lithography (UV-NIL) is a promising technique for direct fabrication of
functional oxide nanostructures. Since it is mostly carried out in aerobic conditions, the free …

An approach to ultraviolet (UV) nanoimprint lithography using a cyclodextrin-based porous
template was investigated for the reduction of air trapping and template damage caused by …

An electron beam (EB) lithography method using inedible cellulose-based resist material
derived from woody biomass has been successfully developed. This method allows the use …

Nanoimprint lithography (NIL) is a useful technique for nano/micropattern replication. For
ultraviolet-NIL (UV-NIL), the volume shrinkage of the resist upon curing is strongly affected …

Thermoplastic polymer micro-and nanostructures suffer pattern decay when heated to a
temperature close to or above the polymer's glass transition temperature. In this work, we …

A gas‐permeable cellulose template for microimprint lithography has been synthesized and
characterized for the reduction of template damage and gas trapping caused by solvents …