Photo-responsive Polymers based on ο-Nitrobenzyl Derivatives: From Structural Design to Applications

T Liu, B Bao, Y Li, Q Lin, L Zhu - Progress in Polymer Science, 2023 - Elsevier
Abstract ο-Nitrobenzyl (ONB) derivatives are one of the most investigated photo-responsive
functional group that features irreversible photolysis under a light stimulus. They are ease of …

Trigger responsive polymeric nanocarriers for cancer therapy

S Kaur, C Prasad, B Balakrishnan, R Banerjee - Biomaterials science, 2015 - pubs.rsc.org
Conventional chemotherapy for the treatment of cancer has limited specificity when
administered systemically and is often associated with toxicity issues. Enhanced …

Recent advances in non-chemically amplified photoresists for next generation IC technology

S Ghosh, CP Pradeep, SK Sharma, PG Reddy… - RSC …, 2016 - pubs.rsc.org
While chemically amplified resists (CARs) have been dominating the semiconductor
industries over the past few decades, particularly in the area of computer chip fabrication …

Novel melamine-based porous organic materials as metal-free catalysts for copolymerization of SO2 with epoxide

Z Li, Y Zhi, Y Ni, H Su, Y Miao, S Shan - Polymer, 2021 - Elsevier
Copolymerization of SO 2 with epoxide into the poly (cyclohexene sulfite)(PCS) is crucial
due to the severe harm of SO 2 to the environment and the wide application need of the PCS …

Alternating sulfone copolymers depolymerize in response to both chemical and mechanical stimuli

K Kumar, AP Goodwin - ACS macro letters, 2015 - ACS Publications
This work describes the depolymerization of poly (vinyl acetate-alt-sulfur dioxide) as initiated
by chemical and mechanical stimuli. In recent years, macromolecules that are able to …

Base-Triggered Degradation of Poly (vinyl ester sulfone) s with Tunable Sensitivity

CM Possanza Casey, JS Moore - ACS Macro Letters, 2016 - ACS Publications
A series of poly (vinyl ester sulfone) s are synthesized and are found to rapidly degrade in
the presence of base. Solution phase NMR indicates that the sensitivity of these polymers to …

Formation of thermo‐sensitive and cross‐linkable micelles by self‐assembly of poly (pentafluorophenyl acrylate)‐containing block copolymer

W Graisuwan, H Zhao… - Journal of Polymer …, 2015 - Wiley Online Library
ABSTRACT Poly (pentafluorophenyl acrylate)‐block‐poly (N‐isopropylacrylamide)(PPFPA‐
b‐PNIPAM) is synthesized by reversible addition‐fragmentation chain transfer (RAFT) …

Recent Advances in Positive Photoresists: Mechanisms and Fabrication

M Hassaan, U Saleem, A Singh, AJ Haque, K Wang - Materials, 2024 - mdpi.com
Photoresists are fundamental materials in photolithography and are crucial for precise
patterning in microelectronic devices, MEMS, and nanostructures. This paper provides an in …

Water developable non-chemically amplified photoresist for electron beam and extreme ultraviolet lithography

Z Wang, J Chen, T Yu, Y Zeng, G Yang… - Journal of Micro …, 2022 - spiedigitallibrary.org
Background: Non-chemically amplified resist (n-CAR) shows great potential as a unique
lithographic material because it avoids some disadvantages of CAR, such as post-exposure …

Series of High Magnetic Resonance-Guided Photoinduced Nanodelivery Systems for Precisely Improving the Efficiency of Cancer Therapy

C Liu, W Yao, H Zhou, H Chen, S Yu… - ACS Applied Materials & …, 2022 - ACS Publications
Nanochemotherapy is recognized as one of the most promising cancer treatment options,
and the design of the carrier has a crucial impact on the final efficacy. To precisely improve …