Learning a convolutional neural network for non-uniform motion blur removal

J Sun, W Cao, Z Xu, J Ponce - Proceedings of the IEEE …, 2015 - openaccess.thecvf.com
In this paper, we address the problem of estimating and removing non-uniform motion blur
from a single blurry image. We propose a deep learning approach to predicting the …

Opportunities and challenges of tunnel FETs

R Pandey, S Mookerjea, S Datta - IEEE Transactions on …, 2016 - ieeexplore.ieee.org
Sustaining of Moore's Law over the next decade will require not only continued scaling of
the physical dimensions of transistors but also performance improvement and aggressive …

Demonstration of a p-type ferroelectric FET with immediate read-after-write capability

D Kleimaier, H Mulaosmanovic… - IEEE Electron …, 2021 - ieeexplore.ieee.org
In this letter, p-type ferroelectric field-effect-transistors (FeFETs) based on HfO 2 and
embedded in GlobalFoundries 28 nm bulk high-metal gate (HKMG) technology (28SLPe) …

BTI reliability of advanced gate stacks for Beyond-Silicon devices: Challenges and opportunities

G Groeseneken, J Franco, M Cho… - 2014 IEEE …, 2014 - ieeexplore.ieee.org
Our present understanding of BTI in Si and (Si) Ge based sub 1-nanometer EOT MOSFET
devices is reviewed and extended to benchmark other Beyond-Si based devices. We …

Understanding and modelling the PBTI reliability of thin-film IGZO transistors

A Chasin, J Franco, K Triantopoulos… - 2021 IEEE …, 2021 - ieeexplore.ieee.org
We study the impact of the gate-dielectric on the Positive Bias Temperature Instability (PBTI)
of IGZO thin-film transistors (TFT). We show that PBTI is controlled by the gate-dielectric pre …

SiGe channel technology: Superior reliability toward ultrathin EOT devices—Part I: NBTI

J Franco, B Kaczer, PJ Roussel, J Mitard… - … on Electron Devices, 2012 - ieeexplore.ieee.org
We report extensive experimental results of the negative bias temperature instability (NBTI)
reliability of SiGe channel pMOSFETs as a function of the main gate-stack parameters. The …

Reliability challenges of real-time systems in forthcoming technology nodes

S Hamdioui, D Gizopoulos, G Guido… - … , Automation & Test …, 2013 - ieeexplore.ieee.org
Forthcoming technology nodes are posing major challenges on the manufacturing of
reliable (real-time) systems: process variations, accelerated degradation aging, as well as …

Channel Hot Carrier Degradation Mechanism in Long/Short Channel -FinFETs

M Cho, P Roussel, B Kaczer… - … on Electron Devices, 2013 - ieeexplore.ieee.org
The channel hot carrier degradation mechanisms in n-FinFET devices are studied. In long
channel devices, interface degradation by hot carriers mainly degrades the device at the …

Unified mechanism for positive-and negative-bias temperature instability in GaN MOSFETs

A Guo, JA del Alamo - IEEE Transactions on Electron Devices, 2017 - ieeexplore.ieee.org
We present a comprehensive study of bias temperature instability (BTI) in GaN MOSFETs
under moderate positive and negative gate bias stress. We investigate the evolution of …

Performance analysis of gate electrode work function variations in double-gate junctionless FET

S Kumar, AK Chatterjee, R Pandey - Silicon, 2021 - Springer
With inherent structural simplicity due to the omission of ultrasteep pn junctions, the
conventional junctionless FET can be used as a barrier-controlled device with low OFF …