Laser-induced chemical vapor deposition of high-purity metals has been applied to a wide
variety of microelectronics applications. The ability to selectively produce thin metallic films …

The deposition of metal silicide thin films can be undertaken using volatile organometallic
complexes. Organometallic vapor phase epitaxy or metal-organic chemical vapor phase …

Aluminum thin films have been deposited from dimethylaluminum hydride (DMAIH) on
silicon substrates illuminated with a deuterium lamp or an ArF laser. DMAIH was found to be …

Thin films of aluminum oxide and titanium dioxide have been deposited onto gallium
arsenide at low temperatures (< 200° C). A high-pressure xenon–mercury are lamp (1 kW) …

Films of metallic aluminum are utilized widely in several industries. We will begin this
chapter with a brief summary of these and focus on some of the critical physical properties …

Aluminum has been used widely as a conducting material in the fabrication of integrated
circuits, and chemical vapor deposition process for Al has been actively investigated for the …

In thin film technology today, new techniques based on photo-excited processes attract a
great deal of attention. In this article the present status of this field is reviewed from the point …

A framework for phenomenological understanding has been developed using aluminium
deposition from metal alkyl as an example. UV sources are shown to be an efficient means …

Among the factors involved in choosing a metallization system is, as in the case of
dielectrics, a need to decrease signal propagation delay for high-speed logic devices. Al …

Photodecomposition of triisobutylaluminum (TIBA) adsorbed on an aluminum surface by
pulsed ultraviolet laser irradiation is studied by observing the photoproducts with time-of …