Emerging GaN technologies for power, RF, digital, and quantum computing applications: Recent advances and prospects

K Hoo Teo, Y Zhang, N Chowdhury… - Journal of Applied …, 2021 - pubs.aip.org
GaN technology is not only gaining traction in power and RF electronics but is also rapidly
expanding into other application areas including digital and quantum computing electronics …

Next generation electronics on the ultrawide-bandgap aluminum nitride platform

AL Hickman, R Chaudhuri, SJ Bader… - Semiconductor …, 2021 - iopscience.iop.org
Gallium nitride high-electron-mobility transistors (GaN HEMTs) are at a point of rapid growth
in defense (radar, SATCOM) and commercial (5G and beyond) industries. This growth also …

[HTML][HTML] Toward AlGaN channel HEMTs on AlN: Polarization-induced 2DEGs in AlN/AlGaN/AlN heterostructures

J Singhal, R Chaudhuri, A Hickman, V Protasenko… - APL Materials, 2022 - pubs.aip.org
Due to its high breakdown electric field, the ultra-wide bandgap semiconductor AlGaN has
garnered much attention recently as a promising channel material for next-generation high …

N-polar GaN/AlGaN/AlN high electron mobility transistors on single-crystal bulk AlN substrates

E Kim, Z Zhang, J Encomendero, J Singhal… - Applied Physics …, 2023 - pubs.aip.org
Recent observation of high density polarization-induced two-dimensional electron gases in
ultra-thin N-polar GaN layers grown on single-crystal AlN has enabled the development of N …

Investigation on effect of AlN barrier thickness and lateral scalability of Fe-doped recessed T-gate AlN/GaN/SiC HEMT with polarization-graded back barrier for future …

B Mounika, J Ajayan, S Bhattacharya, D Nirmal… - Microelectronics …, 2023 - Elsevier
In this study, the influence of AlN barrier thickness (tb) on the RF & DC performances of 50
nm recessed T-gate Fe-doped AlN/GaN/SiC HEMT is investigated. The proposed HEMT …

High performance millimeter-wave InAlN/GaN HEMT for low voltage RF applications via regrown Ohmic contact with contact ledge structure

Y Zhou, M Mi, M Yang, Y Han, P Wang, Y Chen… - Applied Physics …, 2022 - pubs.aip.org
Benefitting from regrown Ohmic contact with a contact ledge structure, high performance
millimeter-wave InAlN/GaN HEMT is fabricated to satisfy low voltage RF applications …

Nanometer-thick oxide semiconductor transistor with ultra-high drain current

Z Lin, M Si, V Askarpour, C Niu, A Charnas, Z Shang… - ACS …, 2022 - ACS Publications
High drive current is a critical performance parameter in semiconductor devices for high-
speed, low-power logic applications or high-efficiency, high-power, high-speed radio …

Physical insight of thin AlGaN back barrier for millimeter-wave high voltage AlN/GaN on SiC HEMTs

A Shanbhag, F Grandpierron, K Harrouche… - Applied Physics …, 2023 - pubs.aip.org
In this work, physical mechanisms underlying carbon-doped buffer combined with an AlGaN
back-barrier layer are investigated in state-of-the-art millimeter-wave AlN/GaN transistors …

Microwave and Millimeter-Wave GaN HEMTs: Impact of Epitaxial Structure on Short-Channel Effects, Electron Trapping, and Reliability

E Zanoni, C De Santi, Z Gao, M Buffolo… - … on Electron Devices, 2023 - ieeexplore.ieee.org
Application of gallium nitride high-electron-mobility transistors (GaN HEMTs) to millimeter-
wave power amplifiers requires gate length scaling below 150 nm: in order to control short …

[HTML][HTML] X-band epi-BAW resonators

W Zhao, MJ Asadi, L Li, R Chaudhuri… - Journal of Applied …, 2022 - pubs.aip.org
Using epitaxial aluminum nitride (AlN) developed for ultraviolet photonics and high-speed
electronics, we demonstrate suspended AlN thin-film bulk acoustic resonators (FBARs) at …