Gate engineered heterostructure junctionless TFET with Gaussian doping profile for ambipolar suppression and electrical performance improvement

H Aghandeh, SAS Ziabari - Superlattices and Microstructures, 2017 - Elsevier
This study investigates a junctionless tunnel field-effect transistor with a dual material gate
and a heterostructure channel/source interface (DMG-H-JLTFET). We find that using the …

Comparative Investigation of Band Gap and Gate Metal Engineered Novel Si0.2Ge0.8/GaAs Charge Plasma-Based JLTFET for Improved Electrical Performance

K Kumar, A Kumar, V Kumar, SC Sharma - Silicon, 2023 - Springer
Abstract Tunnel FETs (TFETs) need to meet certain conditions to be useful for analog/RF
circuit applications, including a steep subthreshold slope, high current driving capability, and …

Electrical performance improvement of charge plasma-based junctionless TFET using novel coalescence of SiGe/GaAs and heterogeneous gate dielectric

K Kumar, A Kumar, SC Sharma - Applied Physics A, 2023 - Springer
In this research article, a junctionless tunnel field-effect transistor (JLTFET) based on the
charge plasma concept has been proposed and analyzed using novel coalescence of …

A computational study of a carbon nanotube junctionless tunneling field-effect transistor (CNT-JLTFET) based on the charge plasma concept

SH Tahaei, SS Ghoreishi, R Yousefi… - Superlattices and …, 2019 - Elsevier
In this work, a carbon nanotube junctionless tunnel field-effect transistor has been proposed
and investigated. The presented structure uses two isolated gates with the same work …

Investigation of ambipolar conduction and RF stability performance in novel germanium source dual halo dual dielectric triple material surrounding gate TFET

M Venkatesh, GL Priya, NB Balamurugan - Silicon, 2021 - Springer
In this study, we present an ambipolar conduction and RF stability performance for a
Germanium Source Dual Halo Dual Dielectric Triple Material Surrounding Gate Tunnel FET …

RF Perfomance Based Comprehensive Review on Homo and Hetero Structure of DG-JL-TFET

R Tamilarasi, S Karthik - 2023 7th International Conference on …, 2023 - ieeexplore.ieee.org
This exhaustive review focuses on the RF performance of Double-Gate Junctionless Tunnel
Field-Effect Transistors (DG-JL-TFETs) in both homo and hetero-structures. These TFETs …

Influence of germanium source dual halo dual dielectric triple material surrounding gate tunnel FET for improved analog/RF performance

M Venkatesh, M Suguna, NB Balamurugan - Silicon, 2020 - Springer
This paper investigates the RF Stability performance of the Germanium Source Dual Halo
Dual Dielectric Triple Material Surrounding Gate Tunnel FET Ge (SRC)-DH-DD-TM-SG …

An asymmetric nanoscale SOI MOSFET by means of a PN structure as virtual Hole's well at the source side

Z Ramezani, AA Orouji - Silicon, 2019 - Springer
This paper suggests and investigates a pn structure, which emulates as a MOSFET. In the
proposed structure we utilize an L-shape contact with a proper work function over the source …

Improved performance of nanoscale junctionless tunnel field-effect transistor based on gate engineering approach

R Molaei Imen Abadi, SA Sedigh Ziabari - Applied Physics A, 2016 - Springer
In this paper, a first qualitative study on the performance characteristics of dual-work function
gate junctionless TFET (DWG-JLTFET) on the basis of energy band profile modulation is …

Drain current modelling of unipolar junction dual material double-gate MOSFET (UJDMDG) for SoC applications

A Basak, M Chanda, A Sarkar - Microsystem Technologies, 2021 - Springer
A simple continuous analytical model is developed for the drain current of unipolar junction
dual material double gate MOSFET (UJDMDG). The model is based on electrostatic …