Tailored-waveform excitation of capacitively coupled plasmas and the electrical asymmetry effect
T Lafleur - Plasma Sources Science and Technology, 2015 - iopscience.iop.org
Unequal areas of the powered and grounded electrodes in single-frequency capacitively
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
coupled plasmas (CCPs) are well-known to generate a DC self-bias voltage and an …
eduPIC: an introductory particle based code for radio-frequency plasma simulation
Particle based simulations are indispensable tools for numerical studies of charged particle
swarms and low-temperature plasma sources. The main advantage of such approaches is …
swarms and low-temperature plasma sources. The main advantage of such approaches is …
Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
The ionization dynamics in geometrically symmetric parallel plate capacitively coupled
plasmas driven by radio frequency tailored voltage waveforms is investigated using phase …
plasmas driven by radio frequency tailored voltage waveforms is investigated using phase …
Electron bounce-cyclotron resonance in capacitive discharges at low magnetic fields
S Patil, S Sharma, S Sengupta, A Sen… - Physical Review …, 2022 - APS
We report the existence of an enhanced operating regime for a high-frequency, low-
pressure capacitively coupled plasma (CCP) discharge in the presence of a weak magnetic …
pressure capacitively coupled plasma (CCP) discharge in the presence of a weak magnetic …
Direct implicit and explicit energy-conserving particle-in-cell methods for modeling of capacitively coupled plasma devices
Achieving large-scale kinetic modeling is a crucial task for the development and optimization
of modern plasma devices. With the trend of decreasing pressure in applications, such as …
of modern plasma devices. With the trend of decreasing pressure in applications, such as …
Plasma asymmetry and electron and ion energy distribution function in capacitive discharges excited by tailored waveforms
Using a particle-in-cell simulation technique, we investigate the plasma and ionization
asymmetry, higher harmonics generation, and electron and ion energy distribution function …
asymmetry, higher harmonics generation, and electron and ion energy distribution function …
[HTML][HTML] Investigating the effects of electron bounce-cyclotron resonance on plasma dynamics in capacitive discharges operated in the presence of a weak transverse …
S Sharma, S Patil, S Sengupta, A Sen, A Khrabrov… - Physics of …, 2022 - pubs.aip.org
Recently, Patil et al.[Phys. Rev. Res. 4, 013059 (2022)] have reported the existence of an
enhanced operating regime when a low-pressure (5 mTorr) capacitively coupled discharge …
enhanced operating regime when a low-pressure (5 mTorr) capacitively coupled discharge …
Spatial flux and energy asymmetry in a low pressure capacitively coupled plasma discharge excited by sawtooth waveform: A harmonic study
Plasma asymmetry generation in capacitively coupled plasma (CCP) discharges provides
control over vital parameters that are useful in many plasma processing applications. In this …
control over vital parameters that are useful in many plasma processing applications. In this …
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
S Brandt, B Berger, E Schüngel, I Korolov… - Plasma Sources …, 2016 - iopscience.iop.org
The power absorption dynamics of electrons and the electrical asymmetry effect in
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …
capacitive radio-frequency plasmas operated in CF 4 and driven by tailored voltage …
Voltage waveform tailoring in radio frequency plasmas for surface charge neutralization inside etch trenches
The etching of sub micrometer high-aspect-ratio (HAR) features into dielectric materials in
low pressure radio frequency technological plasmas is limited by the accumulation of …
low pressure radio frequency technological plasmas is limited by the accumulation of …