A method and apparatus for providing correction for microloading effects is described.
Hybrid proximity correction techniques are used to make the problem computationally more …

Techniques for fabricating a device include forming a fabrication layout, such as a mask
layout, for a physical design layer, such as a design for an integrated circuit, and identifying …

4231811 A 11/1980 Somekh et a1. proximity effects based on an analysis at the evaluation
434263584 A 1/1984 Bohlen et aL _________ __ 250/4922 point. In other techniques, a …

A simulated wafer image of a physical mask and a defect-free reference image are used to
generate a severity score for each defect, thereby giving a customer meaningful information …

G03F7/70425—Imaging strategies, eg for increasing throughput or resolution, printing
product fields larger than the image field or compensating lithography-or non-lithography …

A mask defect printability simulation server provides simulations, one-dimensional analysis,
and reports to multiple clients over a wide area network, such as the Internet. This network …

In accordance with an inspection system/process, all irregularities, ie potential defects, are
characterized as actual defects. In one embodiment, a severity score is provided for each …

Serious defects on a mask can compromise the functionality of the integrated circuits formed
on the wafer. Nuisance defects, which do not affect the functionality, waste expen sive …

4,426,584 A 1/1984 Bohlen et al............ 250/492.2 output. The initial output is based on a first
position for a (List continued on next page.) Segment in a fabrication layout. The first position …

G03F7/70425—Imaging strategies, eg for increasing throughput or resolution, printing
product fields larger than the image field or compensating lithography-or non-lithography …