Microloading effect correction

H Liu - US Patent 6,684,382, 2004 - Google Patents
A method and apparatus for providing correction for microloading effects is described.
Hybrid proximity correction techniques are used to make the problem computationally more …

Dissection of printed edges from a fabrication layout for correcting proximity effects

C Pierrat, Y Zhang - US Patent 6,918,104, 2005 - Google Patents
Techniques for fabricating a device include forming a fabrication layout, such as a mask
layout, for a physical design layer, such as a design for an integrated circuit, and identifying …

Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout

C Pierrat, Y Zhang - US Patent 6,453,457, 2002 - Google Patents
4231811 A 11/1980 Somekh et a1. proximity effects based on an analysis at the evaluation
434263584 A 1/1984 Bohlen et aL _________ __ 250/4922 point. In other techniques, a …

System and method of providing mask defect printability analysis

L Cai, L Karklin, L Pang - US Patent 6,873,720, 2005 - Google Patents
A simulated wafer image of a physical mask and a defect-free reference image are used to
generate a severity score for each defect, thereby giving a customer meaningful information …

User interface for a networked-based mask defect printability analysis system

L Pang, DW Howard - US Patent 7,003,755, 2006 - Google Patents
G03F7/70425—Imaging strategies, eg for increasing throughput or resolution, printing
product fields larger than the image field or compensating lithography-or non-lithography …

Method and apparatus for a network-based mask defect printability analysis system

L Pang, DW Howard, L Karklin - US Patent 6,578,188, 2003 - Google Patents
A mask defect printability simulation server provides simulations, one-dimensional analysis,
and reports to multiple clients over a wide area network, such as the Internet. This network …

System and method of providing mask defect printability analysis

L Cai, L Karklin, L Pang - US Patent 7,254,251, 2007 - Google Patents
In accordance with an inspection system/process, all irregularities, ie potential defects, are
characterized as actual defects. In one embodiment, a severity score is provided for each …

System and method for providing defect printability analysis of photolithographic masks with job-based automation

L Pang, FC Chang - US Patent 7,093,229, 2006 - Google Patents
Serious defects on a mask can compromise the functionality of the integrated circuits formed
on the wafer. Nuisance defects, which do not affect the functionality, waste expen sive …

Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects

C Pierrat, Y Zhang - US Patent 6,665,856, 2003 - Google Patents
4,426,584 A 1/1984 Bohlen et al............ 250/492.2 output. The initial output is based on a first
position for a (List continued on next page.) Segment in a fabrication layout. The first position …

System and method of providing mask quality control

L Karklin, L Pang, L Cai - US Patent 6,925,202, 2005 - Google Patents
G03F7/70425—Imaging strategies, eg for increasing throughput or resolution, printing
product fields larger than the image field or compensating lithography-or non-lithography …