Investigation of structural, phonon modes and electronic environment of GaP: Si nanostructure thin films
In the present work, silicon-doped gallium phosphide (GaP: Si) nanostructure thin films were
deposited using atmospheric pressure chemical vapor deposition (APCVD) with Si doping …
deposited using atmospheric pressure chemical vapor deposition (APCVD) with Si doping …
Ti2NTx MXene/rGO nanocomposites: Optical tunning, functional bonding and electrochemical analysis for supercapacitor electrode application
Abstract Ti 2 NTx MXene/rGO nanocomposites were prepared via a two-step chemical
etching and reduction method. TEM confirmed the stacked multilayer structure with an …
etching and reduction method. TEM confirmed the stacked multilayer structure with an …
Effect of interlayer thickness on electrochemical properties and corrosion resistance of sputtered TiNxnm/Tixnm multilayer thin films
Abstract Three multilayers [TiN xnm/Ti xnm/p-type Si (100)](x= 2.5, 5, 10) were fabricated
using a dc-magnetron sputtering to evaluate surface and interfacial effect on electrochemical …
using a dc-magnetron sputtering to evaluate surface and interfacial effect on electrochemical …
Comparative Assessment and Experimental Analysis of Atomic Coordination and Mechanical Properties of Sputter Deposited Ti-rich TiN, TiC, and TiCN thin films.
In the present work, Titanium nitride (TiN) 150nm, Titanium on Titanium nitride (TiN 75nm/Ti
75nm), Titanium on Titanium carbonitride (TiCN 75nm/Ti 75nm), and Titanium on Titanium …
75nm), Titanium on Titanium carbonitride (TiCN 75nm/Ti 75nm), and Titanium on Titanium …