With the development of microelectronics, the demand for continuously miniaturized feature
sizes has driven continuous progress in lithography technology. Extreme ultraviolet (EUV) …

The nanotechnology revolution of the past decade owes much to the science of lithography,
an umbrella term which encompasses everything from conventional photolithography to …

Historically, in the mass production of semiconductor devices, exposure tools have been
repeatedly replaced with those with a shorter wavelength to meet the resolution …

This review describes the versatile chemistry of photolithographic imaging materials
developed for nanofabrication of semiconductor devices. Conventional photoresists based …

Extreme ultra violet (EUV) lithography is one of the most promising next generation
lithographic techniques for the production of sub-50 nm feature sizes with applications in the …

Computers and other electronic devices are an integral and ubiquitous part of the modern
world. One of the key drivers for the development, power, cost, and availability of these …

We present a focused review of photoresist strategies that have been studied over the past
few decades driven by the demands of Moore's law. Selected results are discussed with …

摘要极紫外(EUV) 光刻技术是半导体制造业中应用的最先进光刻技术, 与之配套的光刻胶近年来
也有了长足发展. 本文结合EUV 光刻技术面临的新问题和新挑战, 分别对高分子型 …

We have recently shown that molecular glasses, small molecules capable of readily forming
glassy solids as opposed to crystals, can be designed by exploiting molecular association …

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