Electron cyclotron resonance microwave discharges for etching and thin‐film deposition

J Asmussen - Journal of Vacuum Science & Technology A: Vacuum …, 1989 - pubs.aip.org
A recent, important development in low‐pressure and low‐temperature plasma processing
is the microwave electron cyclotron resonance (ECR) discharge. Its lack of electrodes and its …

Microwave discharges at low pressures and peculiarities of the processes in strongly non-uniform plasma

YA Lebedev - Plasma Sources Science and Technology, 2015 - iopscience.iop.org
Microwave discharges (MD) are widely used as a source of non-equilibrium low pressure
plasma for different applications. This paper reviews the methods of microwave plasma …

A small microwave plasma source for long column production without magnetic field

M Moisan, C Beaudry, P Leprince - IEEE Transactions on …, 1975 - ieeexplore.ieee.org
A new HF device is described. It allows the production, without the use of a magnetic field, of
long plasma columns from a small HF coupling structure situated at one end of the column …

Microwave-supported discharges

AT Zander, GM Hieftje - Applied Spectroscopy, 1981 - opg.optica.org
A review is presented on the historical, fundamental, and practical aspects of microwave-
induced plasmas (MIP) and their application to spectrochemical analysis. In particular, the …

Microwave plasma reactor design for high pressure and high power density diamond synthesis

Y Gu, J Lu, T Grotjohn, T Schuelke… - Diamond and related …, 2012 - Elsevier
The design and performance of an improved microwave plasma assisted chemical vapor
deposition (MPACVD) reactor is described. This reactor operates with high power densities …

The similarity laws for the maintenance field and the absorbed power per electron in low-pressure surface wave produced plasmas and their extension to HF plasmas …

CM Ferreira, M Moisan - Physica Scripta, 1988 - iopscience.iop.org
This paper presents a theoretical analysis of high-frequency, diffusion-controlled discharges
in which the ionization is provided by direct electron impact with gas atoms within the …

[图书][B] Sintering of alumina in a microwave-induced oxygen plasma

H Su - 1996 - search.proquest.com
Small cylindrical tubes made from alumina and alumina doped with magnesia were sintered
in a microwave induced oxygen plasma, initiated and sustained inside a tunable single …

Ion generating apparatus and method for the use thereof

J Asmussen, JJ Root - US Patent 4,507,588, 1985 - Google Patents
US4507588A - Ion generating apparatus and method for the use thereof - Google Patents
US4507588A - Ion generating apparatus and method for the use thereof - Google Patents Ion …

Extending microwave plasma assisted CVD SCD growth to pressures of 400 Torr

M Muehle, J Asmussen, MF Becker… - Diamond and Related …, 2017 - Elsevier
The fundamental operational behavior of a microwave cavity plasma reactor was studied for
pressures between 120 and 400 Torr, ie the plasma dimensions, the absorbed power …

Method for treating a material using radiofrequency waves

J Asmussen - US Patent 4,777,336, 1988 - Google Patents
A method (1) for determining and controlling patterns of change of heating as a function of
time for controlled heating of similar materials B, Ba or Bb or (2) for deter mining changing …